SCHEMBL28078952

SCHEMBL28078952

O=C(Cl)CC(F)(F)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8614471 0.76 TSHR (0.31)
SCHEMBL61462 0.75
SCHEMBL28661533 0.75 TSHR (0.38)
SCHEMBL29007494 0.73
SCHEMBL15284323 0.73
SCHEMBL9680962 0.71 TSHR (0.35)
SCHEMBL17803442 0.71
SCHEMBL28671390 0.71 TSHR (0.35)
SCHEMBL7746520 0.71
SCHEMBL29007506 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116199659-B Preparation method of 4, 4-difluoro-3, 4-dihydrocoumarin compound 山东金吉利新材料有限公司 2025-05-27 CN claimed
CN-116199659-B Preparation method of 4, 4-difluoro-3, 4-dihydrocoumarin compound 山东金吉利新材料有限公司 2025-05-27 CN disclosed
CN-116199659-A Preparation method of 4, 4-difluoro-3, 4-dihydrocoumarin compound 山东金吉利新材料有限公司 2023-06-02 CN disclosed
CN-103508994-B Photoacid generators, photoresists comprising same, and coated articles comprising same 罗门哈斯电子材料有限公司 2016-09-07 CN disclosed
CN-105777703-A Photoacid generator, photoresist containing the photoacid generator, and coated product containing the photoresist 罗门哈斯电子材料有限公司 2016-07-20 CN disclosed