Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.66 |
| ▸ | HCAR2 | Q8TDS4 | 5/20 | 0.62 |
| ▸ | HPGD | P15428 | 1/20 | 0.52 |
| ▸ | TSHR | P16473 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.48 |
| ▸ | APP | P05067 | 5/20 | 0.43 |
| ▸ | PRKCA | P17252 | 2/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL136328 | 0.94 | ATM (0.73) | ATMHCAR2HPGDTSHRMAPT | |
| SCHEMBL1574088 | 0.94 | ATM (0.73) | ATMHCAR2HPGDTSHRMAPT | |
| Methacrylic Acid SCHEMBL27985959 | 0.90 | ATM (0.58) | ATMHCAR2HPGDTSHRMAPT | |
| Butyric Acid SCHEMBL27978125 | 0.88 | ATM (0.59) | ATMHCAR2HPGDTSHRMAPT | |
| Trifluoroacetic Acid SCHEMBL28015373 | 0.87 | ATM (0.58) | ATMHCAR2HPGDTSHRMAPT | |
| Acetic Acid SCHEMBL1275281 | 0.87 | ATM (0.87) | ATMHCAR2HPGDTSHRMAPT | |
| Acetic Acid SCHEMBL1275284 | 0.87 | ATM (0.87) | ATMHCAR2HPGDTSHRMAPT | |
| Acetic Acid SCHEMBL3365823 | 0.87 | ATM (0.87) | ATMHCAR2HPGDTSHRMAPT | |
| Methacrylic Acid SCHEMBL28826785 | 0.86 | ATM (0.53) | ATMHCAR2HPGDTSHRMAPT | |
| Acrylic Acid Methyl Ester SCHEMBL27985958 | 0.83 | TSHR (0.64) | ATMHCAR2HPGDTSHRMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101602949-B | Liquid crystal alignment agent and liquid crystal display element | JSR CORP | 2015-07-01 | — | — | CN | claimed |
| CN-102126951-B | Crosslinkable compound and photosensitive composition comprising the same | LG CHEMICAL LTD | 2015-03-18 | — | — | CN | claimed |
| CN-105408244-B | Method for manufacturing metal oxide film and method for manufacturing transistor | 株式会社尼康 | 2019-04-12 | — | — | CN | disclosed |
| CN-105814162-B | Solvent compositions are used in electric device manufacture | 株式会社大赛璐 | 2019-03-29 | — | — | CN | disclosed |
| CN-108565207-A | The manufacturing method of metal oxide film and the manufacturing method of transistor | 株式会社尼康 | 2018-09-21 | — | — | CN | disclosed |
| CN-108290991-A | Resin containing phenolic hydroxyl group and etchant resist | DIC株式会社 | 2018-07-17 | — | — | CN | disclosed |
| CN-108027570-A | Composition for coating resist pattern comprising polysiloxane containing vinyl group or (meth) acryloyloxy group | 日产化学工业株式会社 | 2018-05-11 | — | — | CN | disclosed |
| CN-104812852-B | Paint composition with excellent stain resistance and by coating the paint film that this composition is obtained | 阿克佐诺贝尔国际涂料股份有限公司 | 2017-09-22 | — | — | CN | disclosed |
| CN-103998987-B | The bottom antireflective coating formation composition that can develop | 默克专利有限公司 | 2017-07-04 | — | — | CN | disclosed |
| CN-104684960-B | polycarboxylic acid resin and epoxy resin composition | 日本化药株式会社 | 2017-05-10 | — | — | CN | disclosed |
| CN-106604912-A | Oxime sulfonate derivatives | 巴斯夫欧洲公司 | 2017-04-26 | — | — | CN | disclosed |
| CN-105315742-A | THERMOSETTING POWDER COATING MATERIAL AND COATED ARTICLE | FUJI XEROX CO LTD | 2016-02-10 | — | — | CN | disclosed |
| CN-104822771-A | Heat-curable coloring composition, cured film, touch panel provided with said cured film, and method for producing touch panel using said heat-curable coloring composition | TORAY INDUSTRIES | 2015-08-05 | — | — | CN | disclosed |
| CN-102445848-B | The method of photoetching compositions and formation photoengraving pattern | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2015-08-05 | — | — | CN | disclosed |
| CN-104812852-A | Paint composition which has excellent staining resistance and paint films obtained by coating same | BASF COATINGS GMBH | 2015-07-29 | — | — | CN | disclosed |
| CN-101602949-B | Liquid crystal alignment agent and liquid crystal display element | JSR CORP | 2015-07-01 | — | — | CN | disclosed |
| CN-104684960-A | Polycarboxylic acid resin and epoxy resin composition | NIPPON KAYAKU KK | 2015-06-03 | — | — | CN | disclosed |
| CN-102126951-B | Crosslinkable compound and photosensitive composition comprising the same | LG CHEMICAL LTD | 2015-03-18 | — | — | CN | disclosed |
| CN-102459084-B | Black composite particle, black resin composition, color filter substrate and liquid crystal display | TORAY INDUSTRIES | 2015-03-18 | — | — | CN | disclosed |
| CN-102053425-B | Liquid crystal display element manufacturing method , polymer composition and liquid crystal display element | JSR CORP | 2014-12-17 | — | — | CN | disclosed |