Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 9/20 | 0.39 |
| ▸ | CA2 | P00918 | 9/20 | 0.39 |
| ▸ | CA9 | Q16790 | 8/20 | 0.39 |
| ▸ | LPAR3 | Q9UBY5 | 3/20 | 0.38 |
| ▸ | CA12 | O43570 | 3/20 | 0.38 |
| ▸ | CA7 | P43166 | 3/20 | 0.38 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.38 |
| ▸ | LPAR1 | Q92633 | 2/20 | 0.38 |
| ▸ | LPAR2 | Q9HBW0 | 2/20 | 0.38 |
| ▸ | CA3 | P07451 | 2/20 | 0.38 |
| ▸ | CA4 | P22748 | 2/20 | 0.38 |
| ▸ | CA6 | P23280 | 2/20 | 0.38 |
| ▸ | CA5A | P35218 | 2/20 | 0.38 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.38 |
| ▸ | NAAA | Q02083 | 1/20 | 0.38 |
| ▸ | CES2 | O00748 | 2/20 | 0.38 |
| ▸ | RECQL | P46063 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1357038 | 0.92 | — | — | |
| SCHEMBL1262866 | 0.80 | — | — | |
| SCHEMBL29018648 | 0.79 | CA1 (0.43) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL252597 | 0.78 | THRB (0.39) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL9498994 | 0.78 | CA1 (0.42) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL24829882 | 0.77 | TSHR (0.39) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL9349496 | 0.77 | GGPS1 (0.47) | CA1CA2CA9LPAR3LPAR1 | |
| SCHEMBL4505591 | 0.76 | THRB (0.44) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL7927231 | 0.76 | CA1 (0.44) | CA1CA2CA9LPAR3CA12 | |
| SCHEMBL24829886 | 0.76 | THRB (0.44) | CA1CA2CA9LPAR3CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895222-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20100248149-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-6878961-B2 | Photosensitive polymeric memory elements | ADVANCED MICRO DEVICES, INC. (US) | 2005-04-12 | — | — | US | disclosed |
| US-20050045877-A1 | PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS | MORGAN STANLEY SENIOR FUNDING, INC. | 2005-03-03 | — | — | US | disclosed |
| US-6861209-B2 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2005-03-01 | — | — | US | disclosed |
| US-6825060-B1 | Photosensitive polymeric memory elements | ADVANCED MICRO DEVICES, INC. | 2004-11-30 | — | — | US | disclosed |
| US-20040106070-A1 | Method to enhance resolution of a chemically amplified photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-06-03 | — | — | US | disclosed |
| US-6534243-B1 | A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature | ADVANCED MICRO DEVICES, INC. | 2003-03-18 | — | — | US | disclosed |
| US-6492075-B1 | COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST | ADVANCED MICRO DEVICES, INC. | 2002-12-10 | — | — | US | disclosed |
| US-6274289-B1 | Chemical resist thickness reduction process | ADVANCED MICRO DEVICES, INC. | 2001-08-14 | — | — | US | disclosed |
| US-5880169-A | HAVING HIGH RESOLUTION FOR FINE PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-09 | — | — | US | disclosed |
| US-5847218-A | Sulfonium salts and chemically amplified positive resist compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-12-08 | — | — | US | disclosed |
| US-5824824-A | AROMATIC SULFONATE ANIONS AND DISSOLUTION CONTRAST IN EXPOSED AND NONEXPOSED AREAS, POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-10-20 | — | — | US | disclosed |