Naphthalene

Naphthalene

SCHEMBL28089347

I.O=Cc1ccccc1.c1ccc2ccccc2c1

nearest known ligand 0.78

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Naphthalene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.78
CYP2A6 P11509 3/20 0.78
ALOX12 P18054 1/20 0.44
RELA Q04206 1/20 0.44
RAB9A P51151 1/20 0.44
LMNA P02545 2/20 0.44
TRPA1 O75762 1/20 0.44
ALOX5 P09917 1/20 0.44
MAPK1 P28482 1/20 0.44
KMT2A Q03164 2/20 0.42
TYR P14679 1/20 0.42
HSD17B10 Q99714 1/20 0.42
ALDH5A1 P51649 1/20 0.42
ABAT P80404 1/20 0.42
UNG P13051 1/20 0.41
PPARG P37231 1/20 0.41
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
BLM P54132 1/20 0.41
TDP1 Q9NUW8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthalene SCHEMBL6005433 0.97 ALDH1A1 (0.82) ALDH1A1CYP2A6ALOX12RELARAB9A
Benzaldehyde SCHEMBL27617148 0.91
Benzaldehyde SCHEMBL1330097 0.88
Benzaldehyde SCHEMBL10051945 0.88
Benzaldehyde SCHEMBL22400699 0.88 ALDH1A1 (1.00) ALDH1A1CYP2A6LMNATRPA1ALOX5
Benzaldehyde SCHEMBL6061133 0.88 ALDH1A1 (1.00) ALDH1A1CYP2A6LMNATRPA1ALOX5
Benzaldehyde SCHEMBL9236967 0.88
Benzaldehyde SCHEMBL896024 0.88 ALDH1A1 (1.00) ALDH1A1CYP2A6LMNATRPA1ALOX5
Benzaldehyde SCHEMBL573 0.88
Benzaldehyde SCHEMBL11784651 0.85 ALDH1A1 (0.93) ALDH1A1CYP2A6LMNATRPA1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107533290-A RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN 三菱瓦斯化学株式会社 2018-01-02 CN disclosed
CN-103717562-B Cyclic compound, its manufacture method, compositions and corrosion-resisting pattern forming method 三菱瓦斯化学株式会社 2016-08-24 CN disclosed