SCHEMBL28094153

SCHEMBL28094153

NCCNCc1ccccc1.NCc1ccccc1N

nearest known ligand 0.52

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.52
KMT2A Q03164 1/20 0.52
TDP1 Q9NUW8 1/20 0.52
MAOA P21397 1/20 0.52
CHRM2 P08172 1/20 0.50
MPO P05164 3/20 0.47
SIGMAR1 Q99720 3/20 0.47
MC4R P32245 2/20 0.46
MC5R P33032 2/20 0.46
GAA P10253 1/20 0.46
MAPT P10636 1/20 0.46
DRD4 P21917 2/20 0.41
PKM P14618 1/20 0.41
MC3R P41968 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167415 0.84 MEN1 (0.73) MEN1KMT2ATDP1MAOACHRM2
Hydrochloric Acid SCHEMBL10382368 0.82 MEN1 (0.70) MEN1KMT2ATDP1MAOACHRM2
Ammonia Solution, Strong SCHEMBL20357468 0.82 MEN1 (0.70) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL9631654 0.82 MEN1 (0.70) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL2346060 0.80 TDP1 (0.74) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL4909407 0.80 TDP1 (0.74) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL4916283 0.80 TDP1 (0.74) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL31078248 0.79 MEN1 (0.65) MEN1KMT2ATDP1MAOACHRM2
Hydrochloric Acid SCHEMBL27998526 0.78 MEN1 (0.71) MEN1KMT2ATDP1MAOACHRM2
SCHEMBL6280288 0.78 PKM (0.58) MEN1KMT2ATDP1MAOACHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103403845-B Method for forming capacitor structure and silicon etching liquid used for the same 富士胶片株式会社 2016-08-10 CN disclosed