Pyridine

Pyridine

SCHEMBL28095684

NCc1cc[nH]c1.c1ccncc1

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 7/20 0.45
CYP2A6 P11509 2/20 0.38
CAPN1 P07384 1/20 0.38
TSHR P16473 1/20 0.35
NAPRT Q6XQN6 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TAAR1 Q96RJ0 1/20 0.33
ADRB2 P07550 1/20 0.33
CHRNA7 P36544 1/20 0.33
PPARA Q07869 1/20 0.30
LOX P28300 1/20 0.30
HRH1 P35367 2/20 0.30
ASIC3 Q9UHC3 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pyridine SCHEMBL28300664 0.85 LOXL2 (0.48) LOXL2CYP2A6CAPN1TSHRNAPRT
SCHEMBL2270853 0.83
Pyridine SCHEMBL28209678 0.81 TSHR (0.38) CAPN1TSHRNAPRTTDP1PPARA
Pyridine SCHEMBL28322390 0.81 TSHR (0.35) CAPN1TSHRNAPRTTDP1PPARA
Pyridine SCHEMBL28079181 0.81 TP53 (0.38) CAPN1TSHRNAPRTTDP1PPARA
Pyridine SCHEMBL28101894 0.81 TSHR (0.38) CYP2A6CAPN1TSHRNAPRTTDP1
Benzylamine SCHEMBL28138405 0.78 LOXL2 (0.56) LOXL2CYP2A6TSHRNAPRTTDP1
Pyridine SCHEMBL28215863 0.78 CAPN1 (0.43) CAPN1TSHRNAPRTTDP1
Pyridine SCHEMBL28318541 0.78 CAPN1 (0.40) CAPN1TSHRNAPRTTDP1
Pyridine SCHEMBL28074890 0.78 TSHR (0.39) LOXL2TSHRNAPRTTDP1PPARA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106243031-A A kind of Ah handkerchief is for the preparation method of Buddhist nun 江苏恒瑞医药股份有限公司 2016-12-21 CN claimed
CN-107286132-A A kind of preparation method for anatabine 宁波智锐新材料有限公司 2017-10-24 CN disclosed
CN-106575082-A Composition for forming upper-layer resist film, and method for manufacturing semiconductor device using said composition 日产化学工业株式会社 2017-04-19 CN disclosed