Naphthalene

Naphthalene

SCHEMBL28099215

CC1CCCCC1.N=C=O.N=C=O.c1ccc2ccccc2c1

nearest known ligand 0.38

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Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 3/20 0.38
RAB9A P51151 3/20 0.38
LMNA P02545 2/20 0.38
MCOLN3 Q8TDD5 1/20 0.38
ACHE P22303 3/20 0.37
FAAH O00519 1/20 0.34
EPHX1 P07099 1/20 0.34
KMT2A Q03164 5/20 0.33
MEN1 O00255 3/20 0.33
ALDH1A1 P00352 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
CYP1A2 P05177 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
STAT3 P40763 1/20 0.33
HPGD P15428 1/20 0.33
KDM4E B2RXH2 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Cyclohexane SCHEMBL9547725 0.82 KMT2A (0.39) ACHEEPHX1KMT2AALDH1A1
SCHEMBL265848 0.82 KMT2A (0.39) ACHEEPHX1KMT2AALDH1A1
Naphthalene SCHEMBL28856855 0.82 CYP2A6 (0.47) MCOLN3KMT2AMEN1ALDH1A1
SCHEMBL28843554 0.82 KMT2A (0.39) ACHEEPHX1KMT2AALDH1A1
SCHEMBL15575 0.82 KMT2A (0.39) ACHEEPHX1KMT2AALDH1A1
SCHEMBL498527 0.82 KMT2A (0.39) ACHEEPHX1KMT2AALDH1A1
Naphthalene SCHEMBL9709165 0.80 CYP2A6 (0.44) MCOLN3KMT2AMEN1ALDH1A1
Methane SCHEMBL20636774 0.80 KMT2A (0.37) ACHEEPHX1KMT2AALDH1A1
Methane SCHEMBL1877115 0.80 KMT2A (0.37) ACHEEPHX1KMT2AALDH1A1
Methylcyclopentane SCHEMBL3876187 0.80 CA1 (0.36) ACHEEPHX1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105985511-A Polyol resin, double-component curable resin composition containing the same, cured product thereof, resin material used for coating and coating film DIC株式会社 2016-10-05 CN disclosed