2-Chlorophenol

2-Chlorophenol

SCHEMBL28102733

Oc1ccccc1Cl.Oc1ccccc1O

nearest known ligand 0.94

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.94
LMNA P02545 4/20 0.62
HSD17B10 Q99714 4/20 0.62
CA2 P00918 4/20 0.62
TDP1 Q9NUW8 3/20 0.62
CYP3A4 P08684 3/20 0.62
ALOX15 P16050 3/20 0.62
EGFR P00533 2/20 0.62
FYN P06241 2/20 0.62
MMP9 P14780 2/20 0.62
HPGD P15428 2/20 0.62
RECQL P46063 2/20 0.62
KDM4E B2RXH2 2/20 0.62
NPC1 O15118 2/20 0.62
MAPT P10636 2/20 0.62
CA4 P22748 2/20 0.62
SMN1; SMN2 Q16637 2/20 0.62
CA12 O43570 1/20 0.62
GMNN O75496 1/20 0.62
POLB P06746 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Chlorophenol SCHEMBL12279 0.97
2-Chlorophenol SCHEMBL29354452 0.97
2-Chlorophenol SCHEMBL8961529 0.97 ALDH1A1 (1.00) ALDH1A1LMNAHSD17B10CA2TDP1
2-Chlorophenol SCHEMBL2426162 0.94
2-Chlorophenol SCHEMBL7865189 0.94
2-Chlorophenol SCHEMBL28686561 0.94
2-Chlorophenol SCHEMBL5444110 0.94
2-Chlorophenol SCHEMBL7389931 0.94
2-Chlorophenol SCHEMBL10882437 0.94 ALDH1A1 (0.94) ALDH1A1LMNAHSD17B10CA2TDP1
2-Chlorophenol SCHEMBL10336163 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110426917-A Photosensitive laminate and its manufacturing method ASAHI KASEI CORP 2019-11-08 CN disclosed
CN-103097954-B Positive photosensitive resin composition, method of creating resist pattern, and electronic component 日立化成株式会社 2017-05-03 CN disclosed
CN-103091987-B Positive type photosensitive organic compound, the manufacture method of resist pattern, semiconductor device and electronic device 日立化成株式会社 2016-11-23 CN disclosed