SCHEMBL28103231

SCHEMBL28103231

CCC(C)CCN=C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL231391 0.87
SCHEMBL10456184 0.85 LMNA (0.31)
SCHEMBL1072173 0.81
SCHEMBL28403399 0.81 LMNA (0.40)
SCHEMBL868602 0.79 LMNA (0.33)
SCHEMBL28920082 0.79
SCHEMBL12559776 0.78
SCHEMBL643922 0.78
SCHEMBL5841490 0.77 LMNA (0.37)
SCHEMBL8016571 0.77

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107629719-A Bonding sheet 日东电工株式会社 2018-01-26 CN disclosed
CN-107629720-A Bonding sheet 日东电工株式会社 2018-01-26 CN disclosed
CN-106125505-A A kind of photosensitive layer for UV CTP 成都新图新材料股份有限公司 2016-11-16 CN disclosed
CN-106054524-A Photoresist for CTP plate aluminum plate base 成都新图新材料股份有限公司 2016-10-26 CN disclosed
CN-106054525-A Chemistry-free negative image photosensitive composite suitable for UV-CTP 成都新图新材料股份有限公司 2016-10-26 CN disclosed
CN-104364683-B Polaroid, the manufacture method of polaroid and image display device 柯尼卡美能达株式会社 2016-10-12 CN disclosed