Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.56 |
| ▸ | F2 | P00734 | 1/20 | 0.56 |
| ▸ | TSHR | P16473 | 4/20 | 0.52 |
| ▸ | AKT1 | P31749 | 1/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.47 |
| ▸ | TP53 | P04637 | 1/20 | 0.47 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.45 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.45 |
| ▸ | CES2 | O00748 | 2/20 | 0.44 |
| ▸ | CES1 | P23141 | 2/20 | 0.44 |
| ▸ | DAO | P14920 | 1/20 | 0.44 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid Vinyl Ester SCHEMBL14903 | 1.00 | LMNA (0.56) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL6551316 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL5014943 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL6551337 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL31173777 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL5014521 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL6551336 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL6552669 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL2909961 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 | |
| Benzoic Acid Vinyl Ester SCHEMBL28793483 | 0.98 | LMNA (0.54) | LMNAF2TSHRAKT1TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106164772-B | The production method of photosensitive polymer combination, original edition of lithographic printing plate and lithographic printing plate | 富士胶片株式会社 | 2019-09-03 | — | — | CN | disclosed |
| CN-110178082-A | The production method of eurymeric original edition of lithographic printing plate and lithographic printing plate | 富士胶片株式会社 | 2019-08-27 | — | — | CN | disclosed |
| CN-106133605-B | Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate | 富士胶片株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-109690403-A | The production method of eurymeric Driginal plate of plate-printing board and plate printing plate | 富士胶片株式会社 | 2019-04-26 | — | — | CN | disclosed |
| CN-109416510-A | Positive photosensitive resin composition, positive lithographic printing plate precursor, and method for producing lithographic printing plate | 富士胶片株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-108700813-A | Positive photosensitive resin composition, positive lithographic printing plate precursor, and method for producing lithographic printing plate | 富士胶片株式会社 | 2018-10-23 | — | — | CN | disclosed |
| CN-107835960-A | Photosensitive resin composition, lithographic printing plate precursor, and method for making lithographic printing plate | 富士胶片株式会社 | 2018-03-23 | — | — | CN | disclosed |
| CN-107209459-A | Photosensitive resin composition, lithographic printing plate precursor, method for producing lithographic printing plate, and polymer compound | 富士胶片株式会社 | 2017-09-26 | — | — | CN | disclosed |
| CN-107077069-A | Photosensitive resin composition, lithographic printing plate precursor, method for producing lithographic printing plate, and polymer compound | 富士胶片株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-106164772-A | The manufacture method of photosensitive polymer combination, original edition of lithographic printing plate and lithographic plate | 富士胶片株式会社 | 2016-11-23 | — | — | CN | disclosed |
| CN-106133605-A | Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate | 富士胶片株式会社 | 2016-11-16 | — | — | CN | disclosed |