Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.62 |
| ▸ | APP | P05067 | 2/20 | 0.57 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.57 |
| ▸ | ASIC3 | Q9UHC3 | 2/20 | 0.56 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.53 |
| ▸ | MTOR | P42345 | 1/20 | 0.53 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.53 |
| ▸ | CA12 | O43570 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.52 |
| ▸ | CA9 | Q16790 | 1/20 | 0.52 |
| ▸ | MAOA | P21397 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29462452 | 1.00 | MAPT (0.62) | MAPTAPPFFAR1ASIC3PIK3CA | |
| Hydrochloric Acid SCHEMBL7919919 | 0.98 | MAPT (0.60) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL9611202 | 0.93 | FFAR1 (0.59) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL4968126 | 0.93 | CYP3A4 (0.58) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL20717640 | 0.89 | MAPT (0.50) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL9611201 | 0.88 | MAPT (0.67) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL4970529 | 0.88 | MAPT (0.67) | MAPTAPPFFAR1ASIC3PIK3CA | |
| SCHEMBL18561138 | 0.83 | MAPT (0.65) | MAPTAPPFFAR1ASIC3MTOR | |
| SCHEMBL13717014 | 0.83 | MAPT (0.73) | MAPTAPPFFAR1ASIC3MTOR | |
| SCHEMBL2266577 | 0.83 | CYP3A4 (0.52) | MAPTFFAR1ASIC3PIK3CAMTOR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 119 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | claimed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-114995061-B | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115220305-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-114995061-A | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| US-20220177650-A1 | POLYIMIDE FILM PREPARATION METHOD AND APPLICATION THEREOF | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2022-06-09 | — | — | US | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| WO-2020200229-A1 | POLYIMIDE THIN FILM AND PREPARATION METHOD AND APPLICATION THEREOF | 中国科学院化学研究所 | 2020-10-08 | — | — | WO | claimed |
| US-8993710-B1 | Polyimides derived from novel asymmetric benzophenone dianhydrides | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 2015-03-31 | — | — | US | claimed |
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | disclosed |
| EP-0279921-A2 | Phenylacetylene-substituted schiff's base momomers and electroconductive polymers | National Starch and Chemical Investment Holding Corporation (US) | 1988-08-31 | — | — | EP | disclosed |
| US-4730032-A | MOLDING MATERIALS | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1988-03-08 | — | — | US | disclosed |