SCHEMBL28113631

SCHEMBL28113631

CC(CO)c1ccc(O)cc1.CC(CO)c1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 5/20 0.57
ESR1 P03372 4/20 0.53
ESR2 Q92731 3/20 0.53
TAAR1 Q96RJ0 3/20 0.48
PDCD1 Q15116 1/20 0.48
CD274 Q9NZQ7 1/20 0.48
LMNA P02545 3/20 0.47
HSD17B10 Q99714 2/20 0.47
ALDH1A1 P00352 1/20 0.47
MIF P14174 1/20 0.46
IDO1 P14902 1/20 0.46
TDO2 P48775 1/20 0.46
AOC3 Q16853 1/20 0.44
CYP1A2 P05177 1/20 0.43
PGR P06401 1/20 0.43
CHRM2 P08172 1/20 0.43
CYP3A4 P08684 1/20 0.43
ADORA3 P0DMS8 1/20 0.43
AR P10275 1/20 0.43
CYP2D6 P10635 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL28254068 0.96 ESR1 (0.57) TRPA1ESR1ESR2TAAR1PDCD1
SCHEMBL12195409 0.91 ESR1 (0.61) TRPA1ESR1ESR2TAAR1PDCD1
SCHEMBL548248 0.91 ESR1 (0.61) TRPA1ESR1ESR2TAAR1PDCD1
SCHEMBL61000 0.89 TRPA1 (0.68) TRPA1TAAR1LMNAALDH1A1AOC3
SCHEMBL60429 0.89 TRPA1 (0.68) TRPA1TAAR1LMNAALDH1A1AOC3
SCHEMBL1260 0.89 TRPA1 (0.68) TRPA1TAAR1LMNAALDH1A1AOC3
SCHEMBL8976575 0.87 TRPA1 (0.65) TRPA1TAAR1LMNAALDH1A1AOC3
Ammonia Solution, Strong SCHEMBL28122152 0.87 TRPA1 (0.65) TRPA1TAAR1LMNAALDH1A1AOC3
Hydrochloric Acid SCHEMBL28757862 0.87 TRPA1 (0.65) TRPA1TAAR1LMNAALDH1A1AOC3
Methane SCHEMBL27517092 0.87 TRPA1 (0.65) TRPA1TAAR1LMNAALDH1A1AOC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106133604-B Protectant composition and protectant pattern forming method 三菱瓦斯化学株式会社 2019-09-06 CN disclosed
CN-106133604-A Protectant composition and protectant pattern forming method 三菱瓦斯化学株式会社 2016-11-16 CN disclosed