Benzene

Benzene

SCHEMBL28128787

C=CC(=O)OCC=CC.c1ccccc1

nearest known ligand 0.44

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.44
THRB P10828 5/20 0.43
HPGD P15428 1/20 0.42
ALDH1A1 P00352 4/20 0.42
TP53 P04637 3/20 0.42
HIF1A Q16665 3/20 0.42
CYP3A4 P08684 3/20 0.42
HSD17B10 Q99714 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.38
MAPK1 P28482 1/20 0.38
PKM P14618 1/20 0.32
MAPT P10636 1/20 0.31
CACNA1B Q00975 1/20 0.31
APBA1 Q02410 1/20 0.31
THRA P10827 1/20 0.30
AKT1 P31749 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL491231 0.94
SCHEMBL237830 0.94
SCHEMBL27947504 0.94 TSHR (0.48) TSHRTHRBHPGDALDH1A1TP53
Acrylic Acid SCHEMBL28039947 0.92 TSHR (0.44) TSHRTHRBHPGDALDH1A1TP53
Propene SCHEMBL28181465 0.92 TSHR (0.47) TSHRTHRBHPGDALDH1A1TP53
Methane SCHEMBL27884431 0.92 TSHR (0.47) TSHRTHRBHPGDALDH1A1TP53
Ethylene SCHEMBL27355303 0.92 TSHR (0.47) TSHRTHRBHPGDALDH1A1TP53
Formaldehyde SCHEMBL27599679 0.92 TSHR (0.47) TSHRTHRBHPGDALDH1A1TP53
Acrylic Acid SCHEMBL27448708 0.90 TSHR (0.42) TSHRTHRBHPGDALDH1A1TP53
Butadiene SCHEMBL28164245 0.90 TSHR (0.45) TSHRTHRBHPGDALDH1A1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107660230-A Coal adhesive composition 巴斯夫欧洲公司 2018-02-02 CN claimed
CN-105246931-B Porous resin particle, method for producing porous resin particle, dispersion liquid, and use of porous resin particle 积水化成品工业株式会社 2017-03-29 CN disclosed