Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DNM1 | Q05193 | 8/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.46 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.37 |
| ▸ | GNAI3 | P08754 | 1/20 | 0.37 |
| ▸ | GNAO1 | P09471 | 1/20 | 0.37 |
| ▸ | GNAI1 | P63096 | 1/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL169585 | 0.82 | — | — | |
| SCHEMBL9294670 | 0.82 | — | — | |
| Isopropyl Alcohol SCHEMBL28120309 | 0.78 | DNM1 (0.67) | DNM1MEN1KMT2AALDH1A1TSHR | |
| Isopropyl Alcohol SCHEMBL28139023 | 0.78 | DNM1 (0.67) | DNM1MEN1KMT2AALDH1A1TSHR | |
| SCHEMBL6730336 | 0.77 | SPHK1 (0.54) | SPHK1OPRM1HTTTP53 | |
| Hexadecylamine SCHEMBL10523889 | 0.76 | DNM1 (0.65) | DNM1MEN1KMT2AALDH1A1TSHR | |
| Propylene Glycol SCHEMBL28098139 | 0.76 | DNM1 (0.57) | DNM1MEN1KMT2AALDH1A1TSHR | |
| Hexadecylamine SCHEMBL28866782 | 0.75 | DNM1 (0.72) | DNM1MEN1KMT2AALDH1A1TSHR | |
| Octadecylamine SCHEMBL29170968 | 0.75 | DNM1 (0.72) | DNM1MEN1KMT2AALDH1A1TSHR | |
| Hexadecylamine SCHEMBL28421106 | 0.75 | DNM1 (0.72) | DNM1MEN1KMT2AALDH1A1TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109791362-A | The coating composition being used together with outer painting photoresist | 罗门哈斯电子材料韩国有限公司 | 2019-05-21 | — | — | CN | disclosed |
| CN-109725492-A | The lower layer's coating composition being used together with photoresist | 罗门哈斯电子材料韩国有限公司 | 2019-05-07 | — | — | CN | disclosed |
| CN-109725493-A | The primer composition being used together with photoresist | 罗门哈斯电子材料韩国有限公司 | 2019-05-07 | — | — | CN | disclosed |
| CN-109541886-A | Antireflective composition with thermal acid generator | 罗门哈斯电子材料韩国有限公司 | 2019-03-29 | — | — | CN | disclosed |
| CN-103913951-B | Acid agent and photoresist containing it | 罗门哈斯电子材料有限公司 | 2019-01-08 | — | — | CN | disclosed |
| CN-104725558-B | The method that photic acid generates copolymer and relevant photoetching compositions, the base material of coating and formation electronic device | 罗门哈斯电子材料有限公司 | 2018-07-27 | — | — | CN | disclosed |
| CN-107422607-A | With the coating composition that outer painting photoresist is used together | 罗门哈斯电子材料韩国有限公司 | 2017-12-01 | — | — | CN | disclosed |
| CN-107267039-A | The coating composition being used together with outer applying photoresist | 罗门哈斯电子材料韩国有限公司 | 2017-10-20 | — | — | CN | disclosed |
| CN-106814543-A | The coating composition being used together with outer painting photoresist | 罗门哈斯电子材料韩国有限公司 | 2017-06-09 | — | — | CN | disclosed |
| CN-106647170-A | Coating compositions for use with an overcoated photoresist | 罗门哈斯电子材料韩国有限公司 | 2017-05-10 | — | — | CN | disclosed |
| CN-104725557-B | Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device | 罗门哈斯电子材料有限公司 | 2017-04-26 | — | — | CN | disclosed |