SCHEMBL28136204

SCHEMBL28136204

C=C(OC)C(=O)OC(=O)CC(C)=O

nearest known ligand 0.52

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MGAM O43451 1/20 0.52
GAA P10253 1/20 0.52
SI P14410 1/20 0.52
MGAM2 Q2M2H8 1/20 0.52
ALDH1A1 P00352 3/20 0.41
TSHR P16473 3/20 0.33
TDP1 Q9NUW8 2/20 0.32
HSD17B10 Q99714 2/20 0.32
TET2 Q6N021 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1898254 0.83 MGAM (0.52) MGAMGAASIMGAM2ALDH1A1
SCHEMBL27997787 0.82 ALDH1A1 (0.39) MGAMGAASIMGAM2ALDH1A1
SCHEMBL727177 0.82 ALDH1A1 (0.50) MGAMGAASIMGAM2ALDH1A1
SCHEMBL28482825 0.80 ALDH1A1 (0.48) MGAMGAASIMGAM2ALDH1A1
SCHEMBL28280944 0.78 ALDH1A1 (0.36) MGAMGAASIMGAM2ALDH1A1
SCHEMBL2210522 0.78 MGAM (0.46) MGAMGAASIMGAM2ALDH1A1
SCHEMBL27584118 0.77 MGAM (0.44) MGAMGAASIMGAM2ALDH1A1
Ethylene Glycol SCHEMBL5797928 0.77 ALDH1A1 (0.44) MGAMGAASIMGAM2ALDH1A1
SCHEMBL967731 0.77 MGAM (0.55) MGAMGAASIMGAM2ALDH1A1
SCHEMBL5067812 0.77 MGAM (0.55) MGAMGAASIMGAM2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110026216-A To the selective Hydrobon catalyst of gasoline from FCC IFP 新能源公司 2019-07-19 CN claimed
CN-106536652-B Coating composition 关西涂料株式会社 2019-08-16 CN disclosed
CN-110026216-A To the selective Hydrobon catalyst of gasoline from FCC IFP 新能源公司 2019-07-19 CN disclosed
CN-109923119-A Compound, film, which are formed, uses raw material, the manufacturing method of film and amidine compound 株式会社ADEKA 2019-06-21 CN disclosed
CN-109715601-A Diaza dialkenyl compound, film form the manufacturing method with raw material and film 株式会社ADEKA 2019-05-03 CN disclosed
CN-109362226-A Material delivery systems for laminating machine 陶氏环球技术有限责任公司 2019-02-19 CN disclosed
CN-109154080-A Film forms the manufacturing method with raw material and film 株式会社ADEKA 2019-01-04 CN disclosed
CN-107531734-A The manufacture method of new compound, film formation raw material and film 株式会社ADEKA 2018-01-02 CN disclosed
CN-107428677-A Diaza dialkenyl compound, film, which are formed, uses raw material, the manufacture method of film and diaza diolefin compound 株式会社ADEKA 2017-12-01 CN disclosed
CN-107207721-A Modified alkoxylated product with least one non-end alkoxysilyl, the storage stability with raising and improved elongation and the polymer using their preparations 赢创德固赛有限公司 2017-09-26 CN disclosed
CN-104755485-B The manufacture method of aluminium compound, film formation raw material and film 株式会社艾迪科 2017-07-11 CN disclosed
CN-104470892-B Metal alkoxide compound, thin film-forming starting material, method for producing thin film, and alcohol compound 株式会社艾迪科 2017-05-17 CN disclosed
CN-103980103-B PHENOLIC COMPOUND, EPOXY RESIN, EPOXY RESIN COMPOSITION, PREPREG, AND CURED PRODUCT THEREOF 日本化药株式会社 2017-04-12 CN disclosed
CN-106536652-A Coating composition 关西涂料株式会社 2017-03-22 CN disclosed