SCHEMBL2813665

SCHEMBL2813665

C1CC1SOSC1CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1611850 0.85
SCHEMBL2813619 0.85
SCHEMBL27832955 0.84
SCHEMBL27275935 0.82
SCHEMBL27985374 0.78 MEN1 (0.32)
SCHEMBL28452785 0.69
SCHEMBL16747645 0.69
SCHEMBL8015936 0.69
SCHEMBL2813662 0.58
SCHEMBL20983668 0.52

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115094423-A Inorganic film removing liquid suitable for aluminum substrate circuit board and application thereof 深圳市板明科技股份有限公司 2022-09-23 CN claimed
CN-112469768-B Polymerization condition setting method and method for producing optical material 三井化学株式会社 2023-04-28 CN disclosed
CN-115094423-B Inorganic membrane removing liquid suitable for aluminum substrate circuit board and application thereof 深圳市板明科技股份有限公司 2022-11-08 CN disclosed
CN-115094423-A Inorganic film removing liquid suitable for aluminum substrate circuit board and application thereof 深圳市板明科技股份有限公司 2022-09-23 CN disclosed
CN-104220466-B For the method preparing polydiene 株式会社普利司通 2016-09-21 CN disclosed
CN-104220466-A Process for producing polydienes BRIDGESTSONE CORP 2014-12-17 CN disclosed
US-20100249259-A1 HARD FOAM JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (JP) 2010-09-30 US disclosed