SCHEMBL2814971

SCHEMBL2814971

C=CC(=O)Oc1ccc2c(c1)C(=O)c1ccccc1C2=O

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TTR P02766 1/20 0.46
BCL2 P10415 1/20 0.44
MCL1 Q07820 1/20 0.44
ALDH1A1 P00352 3/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
MAPT P10636 3/20 0.43
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
ELANE P08246 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
TSHR P16473 1/20 0.42
MAPK1 P28482 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
KMT2A Q03164 3/20 0.41
THRB P10828 2/20 0.41
MEN1 O00255 2/20 0.41
MAOA P21397 1/20 0.41
PTPRC P08575 1/20 0.41
ADORA2A P29274 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10489363 0.81 MAPT (0.42) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL3793554 0.81 TTR (0.41) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL3912083 0.81 TTR (0.55) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL17481246 0.80 TYMS (0.46) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A
SCHEMBL10880408 0.79 TTR (0.49) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL11298871 0.79 KMT2A (0.55) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL17554244 0.79 TTR (0.53) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL11044160 0.79 TTR (0.49) TTRBCL2MCL1ALDH1A1SMN1; SMN2
SCHEMBL15085173 0.79 MAPT (0.62) TTRBCL2MCL1ALDH1A1SMN1; SMN2
Hydrogen Sulfide SCHEMBL27826386 0.79 BACE1 (0.44) ALDH1A1SMN1; SMN2MAPTNPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404402-B2 Photopolymerisable system for hologram formation SONY DADC AUSTRIA AG (AT) 2013-03-26 US disclosed
US-20100248088-A1 PHOTOPOLYMERISABLE SYSTEM FOR HOLOGRAM FORMATION SONY DADC AUSTRIA AG (AT) 2010-09-30 US disclosed
EP-2233976-A1 Photopolymerisable system for hologram formation Sony DADC Austria AG (AT) 2010-09-29 EP disclosed
CN-101845190-A Be used to form the photopolymerisable system of hologram SONY DADC AUSTRIA AG 2010-09-29 CN disclosed
EP-0610256-B1 POLYAMIDE MATERIALS DU PONT (US) 1998-12-30 EP disclosed
EP-0610256-B1 POLYAMIDE MATERIALS DU PONT (US) 1998-12-30 EP disclosed
US-5512606-A USING A 2-SUBSTITUTED ANTHRAQUINONE AS PHOTO-CROSSLINKING AGENT INVISTA NORTH AMERICA S.A.R.L. 1996-04-30 US disclosed
US-5512606-A USING A 2-SUBSTITUTED ANTHRAQUINONE AS PHOTO-CROSSLINKING AGENT INVISTA NORTH AMERICA S.A.R.L. 1996-04-30 US disclosed
EP-0610256-A1 POLYAMIDE MATERIALS E.I. DU PONT DE NEMOURS & COMPANY INCORPORATED (US) 1994-08-17 EP disclosed
EP-0610256-A1 POLYAMIDE MATERIALS E.I. DU PONT DE NEMOURS & COMPANY INCORPORATED (US) 1994-08-17 EP disclosed
WO-1993009471-A1 POLYAMIDE MATERIALS IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-05-13 WO disclosed
WO-1993009471-A1 POLYAMIDE MATERIALS IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1993-05-13 WO disclosed