SCHEMBL2816246

SCHEMBL2816246

CC[Si](CS)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3668646 0.83
SCHEMBL105943 0.79
SCHEMBL7937005 0.77
SCHEMBL5425227 0.77
SCHEMBL28262937 0.76
SCHEMBL704421 0.73
SCHEMBL705325 0.73
SCHEMBL1482501 0.73
Ethylene SCHEMBL1596834 0.73
SCHEMBL820673 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114958267-B Bi-component silane modified polyether sealant and preparation method thereof 郑州圣莱特空心微珠新材料有限公司 2024-05-28 CN claimed
CN-117586107-A Catalytic method for preparing methyl perfluorobutyl ether from hexafluoropropylene trimer 浙江锦华新材料股份有限公司 2024-02-23 CN claimed
CN-115717295-B Preparation method of graphene underwear fabric for warming, resisting bacteria and heating by far infrared rays 浙江沪江纺织品有限公司 2023-07-21 CN claimed
CN-117586107-A Catalytic method for preparing methyl perfluorobutyl ether from hexafluoropropylene trimer 浙江锦华新材料股份有限公司 2024-02-23 CN disclosed
CN-116646679-A Ceramic coating diaphragm with high thermal stability and preparation method and application thereof 天能电池集团股份有限公司 2023-08-25 CN disclosed
CN-115717295-B Preparation method of graphene underwear fabric for warming, resisting bacteria and heating by far infrared rays 浙江沪江纺织品有限公司 2023-07-21 CN disclosed
US-10031420-B2 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-07-24 US disclosed
US-20160363861-A1 WET-STRIPPABLE SILICON-CONTAINING ANTIREFLECTANT ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-15 US disclosed
US-9442377-B1 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-13 US disclosed
US-8372514-B2 Moisture-curing composition comprising at least two polymers having silane groups SIKA TECHNOLOGY AG (CH) 2013-02-12 US disclosed
US-20100247929-A1 MOISTURE-CURING COMPOSITION COMPRISING AT LEAST TWO POLYMERS HAVING SILANE GROUPS SIKA TECHNOLOGY AG (CH) 2010-09-30 US disclosed
EP-2212365-A1 MOISTURE-CURING COMPOSITION, COMPRISING POLYMERS HAVING AT LEAST TWO SILANE GROUPS Sika Technology AG (CH) 2010-08-04 EP disclosed
WO-2009065654-A1 MOISTURE-CURING COMPOSITION, COMPRISING POLYMERS HAVING AT LEAST TWO SILANE GROUPS SIKA TECHNOLOGY AG (CH) 2009-05-28 WO disclosed
US-7241544-B2 Image forming method KONICA MINOLTA HOLDINGS, INC. (JP) 2007-07-10 US disclosed
US-20050226661-A1 Image forming method KONICA MINOLTA HOLDINGS, INC. (JP) 2005-10-13 US disclosed
EP-0205096-B1 Process for producing silicon containing polymers having comb-shape structure SUNSTAR ENGINEERING INC (JP) 1994-01-26 EP disclosed
US-5079298-A Polysiloxanes, addition-condensation copolymers, water repellency, paints SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1992-01-07 US disclosed
EP-0205096-A2 Process for producing silicon containing polymers having comb-shape structure SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1986-12-17 EP disclosed