SCHEMBL820673

SCHEMBL820673

CCO[Si](CC)(CS)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL103891 0.81
SCHEMBL5420849 0.78
Ammonia Solution, Strong SCHEMBL8004370 0.78
SCHEMBL703874 0.75
SCHEMBL703185 0.75
SCHEMBL760340 0.75
SCHEMBL441243 0.74
SCHEMBL10798099 0.73
SCHEMBL2816246 0.73
SCHEMBL1143237 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10031420-B2 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2018-07-24 US disclosed
US-9988759-B2 Fluorosilicone polymers and surface treatment agent DOW SILICONES CORPORATION (US) 2018-06-05 US disclosed
US-20160363861-A1 WET-STRIPPABLE SILICON-CONTAINING ANTIREFLECTANT ROHM AND HAAS ELECTRONIC MATERIALS LLC 2016-12-15 US disclosed
US-9442377-B1 Wet-strippable silicon-containing antireflectant ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-13 US disclosed
US-9365714-B2 Fluoropolymers and surface treatment agent DAIKIN INDUSTRIES, LTD. (JP) 2016-06-14 US disclosed
US-9170492-B2 Silicon-containing film-forming composition, silicon-containing film, and pattern forming method JSR CORPORATION (JP) 2015-10-27 US disclosed
US-9140985-B2 2015-09-22 US disclosed
US-8552106-B2 Dispersion of fluorosilicones and fluorine- and silicon-containing surface treatment agent DAIKIN INDUSTRIES, LTD. (JP) 2013-10-08 US disclosed
US-8461254-B2 Fluorosilicones and fluorine- and silicon-containing surface treatment agent DOW CORNING CORPORATION (US) 2013-06-11 US disclosed
US-20130078880-A1 Fluoropolymers And Surface Treatment Agent DAIKIN INDUSTRIES, LTD. (JP) 2013-03-28 US disclosed
US-20110124803-A1 Dispersion of Fluorosilicones and Fluorine- and Silicon-Containing Surface Treatment Agent DAIKIN INDUSTRIES, LTD. (JP) 2011-05-26 US disclosed
US-20100233632-A1 SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD JSR CORPORATION (JP) 2010-09-16 US disclosed
US-20100018659-A1 GREASEPROOF PAPER DOW CORNING CORPORATION (US) 2010-01-28 US disclosed
US-7241544-B2 Image forming method KONICA MINOLTA HOLDINGS, INC. (JP) 2007-07-10 US disclosed
US-20050226661-A1 Image forming method KONICA MINOLTA HOLDINGS, INC. (JP) 2005-10-13 US disclosed
EP-0883881-A1 ENAMELLED METALLIC WIRES FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) 1998-12-16 EP disclosed
WO-1998025277-A1 ENAMELLED METALLIC WIRES Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V (DE) 1998-06-11 WO disclosed
EP-0205096-B1 Process for producing silicon containing polymers having comb-shape structure SUNSTAR ENGINEERING INC (JP) 1994-01-26 EP disclosed
US-5079298-A Polysiloxanes, addition-condensation copolymers, water repellency, paints SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1992-01-07 US disclosed
EP-0205096-A2 Process for producing silicon containing polymers having comb-shape structure SUNSTAR GIKEN KABUSHIKI KAISHA (JP) 1986-12-17 EP disclosed