SCHEMBL28164331

SCHEMBL28164331

C=CCC1(CCC(O)O)C(=O)OCCCC1C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL371050 0.70 GAA (0.38)
SCHEMBL2845070 0.68
SCHEMBL28219726 0.62
SCHEMBL603324 0.61 TP53 (0.32)
SCHEMBL576749 0.61 CA1 (0.31)
SCHEMBL19389716 0.60 LMNA (0.32)
SCHEMBL17662035 0.60 LMNA (0.32)
SCHEMBL10431766 0.60 LMNA (0.32)
SCHEMBL981929 0.59
SCHEMBL28217338 0.59 LMNA (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107001558-A Self-repairing urethane resin raw material, self-repairing urethane resin, self-repairing coating material, self-repairing elastomer material, method for producing self-repairing urethane resin raw material, and method for producing self-repairing urethane resin 三井化学株式会社 2017-08-01 CN disclosed
CN-107001557-A Self-repairing urethane resin raw material, self-repairing urethane resin, self-repairing coating material, self-repairing elastomer material, method for producing self-repairing urethane resin raw material, and method for producing self-repairing urethane resin 三井化学株式会社 2017-08-01 CN disclosed