Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ATM | Q13315 | 1/20 | 0.87 |
| ▸ | HCAR2 | Q8TDS4 | 6/20 | 0.81 |
| ▸ | MAPT | P10636 | 1/20 | 0.62 |
| ▸ | RAB9A | P51151 | 1/20 | 0.62 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.62 |
| ▸ | TSHR | P16473 | 3/20 | 0.61 |
| ▸ | HPGD | P15428 | 1/20 | 0.61 |
| ▸ | APP | P05067 | 5/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10423863 | 0.93 | ATM (1.00) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL41998 | 0.93 | ATM (1.00) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL28154 | 0.93 | ATM (1.00) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL269917 | 0.93 | ATM (1.00) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL28153 | 0.93 | ATM (1.00) | ATMHCAR2MAPTRAB9ANPSR1 | |
| Acetic Acid SCHEMBL1275284 | 0.91 | ATM (0.87) | ATMHCAR2MAPTRAB9ANPSR1 | |
| Acetic Acid SCHEMBL3365823 | 0.91 | ATM (0.87) | ATMHCAR2MAPTRAB9ANPSR1 | |
| Acetic Acid SCHEMBL1275281 | 0.91 | ATM (0.87) | ATMHCAR2MAPTRAB9ANPSR1 | |
| Butane SCHEMBL21723575 | 0.91 | ATM (0.95) | ATMHCAR2MAPTRAB9ANPSR1 | |
| SCHEMBL4938576 | 0.91 | ATM (0.95) | ATMHCAR2MAPTRAB9ANPSR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110471257-A | The manufacturing method of photosensitive polymer combination, photosensitive dry film and its manufacturing method, resist film, substrate and plating forming object | TOKYO OHKA KOGYO COMPANY | 2019-11-19 | — | — | CN | disclosed |
| CN-110317174-A | Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component | 东京应化工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-109799680-A | Chemical amplification positive photosensitive resin composition and its application | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-109709770-A | The manufacturing method of resin combination, dry film and manufacturing method, resist film and substrate and plating forming object, sulfhydryl compound | 东京应化工业株式会社 | 2019-05-03 | — | — | CN | disclosed |
| CN-107703658-A | The manufacture method of substrate | 东京应化工业株式会社 | 2018-02-16 | — | — | CN | disclosed |
| CN-107272343-A | Chemical amplification type positive photosensitive polymer combination | 东京应化工业株式会社 | 2017-10-20 | — | — | CN | disclosed |