Itaconate

Itaconate

SCHEMBL28181572

C=C(C)C(=O)OCCC(CC(=O)O)C(=O)O.C=C(CC(=O)O)C(=O)O

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 2/20 0.38
THRB P10828 1/20 0.37
ALOX15 P16050 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TSHR P16473 3/20 0.36
POLB P06746 1/20 0.32
APEX1 P27695 1/20 0.32
HTT P42858 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
TET2 Q6N021 3/20 0.31
TET3 O43151 1/20 0.31
TET1 Q8NFU7 1/20 0.31
ALDH1A1 P00352 1/20 0.31
GRIK1 P39086 1/20 0.30
GRIK2 Q13002 1/20 0.30
GRM1 Q13255 1/20 0.30
GRM2 Q14416 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL159197 0.90 FOLH1 (0.46) FOLH1THRBALOX15TSHRPOLB
Itaconate SCHEMBL9068839 0.82 THRB (0.53) THRBALOX15HSD17B10TSHRPOLB
SCHEMBL2395161 0.81 THRB (0.51) FOLH1THRBHSD17B10TSHRPOLB
SCHEMBL674035 0.81 THRB (0.42) FOLH1THRBALOX15TSHRPOLB
SCHEMBL610577 0.81 TSHR (0.49) FOLH1THRBALOX15TSHRPOLB
SCHEMBL18492409 0.80 THRB (0.50) FOLH1THRBTSHRPOLBAPEX1
SCHEMBL611704 0.80 TSHR (0.51) FOLH1THRBTSHRPOLBAPEX1
SCHEMBL30861795 0.80 THRB (0.50) FOLH1THRBTSHRPOLBAPEX1
Ammonia Solution, Strong SCHEMBL18492401 0.78 THRB (0.48) FOLH1THRBTSHRPOLBAPEX1
Itaconate SCHEMBL10708114 0.77 THRB (0.44) THRBALOX15HSD17B10TSHRPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110471257-A The manufacturing method of photosensitive polymer combination, photosensitive dry film and its manufacturing method, resist film, substrate and plating forming object TOKYO OHKA KOGYO COMPANY 2019-11-19 CN disclosed
CN-103387777-B The forming method of diffusing agent composition and impurity diffusion layer 东京应化工业株式会社 2018-05-25 CN disclosed
CN-107390472-A Chemical amplification type positive photosensitive polymer combination 东京应化工业株式会社 2017-11-24 CN disclosed
CN-107272343-A Chemical amplification type positive photosensitive polymer combination 东京应化工业株式会社 2017-10-20 CN disclosed