⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hexanal SCHEMBL2004174 | 0.90 | — | — | |
| Nonanal SCHEMBL8832383 | 0.87 | TSHR (0.60) | — | |
| Octanal SCHEMBL15990705 | 0.87 | — | — | |
| Tridecanal SCHEMBL4603233 | 0.87 | TSHR (0.60) | — | |
| SCHEMBL4601985 | 0.87 | TSHR (0.60) | — | |
| Heptanal SCHEMBL17181651 | 0.87 | — | — | |
| Palmitaldehyde SCHEMBL4602579 | 0.87 | TSHR (0.60) | — | |
| Butanal SCHEMBL483706 | 0.77 | — | — | |
| SCHEMBL28768 | 0.73 | — | — | |
| SCHEMBL28769 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160009703-A1 | BENZO FIVE-MEMBERED NITROGEN HETEROCYCLIC PIPERIDINE OR PIPERAZINE DERIVATIVES AND PREPARATION METHODS AND PHARMACEUTICAL COMPOSITIONS THEREOF | LIAONING EMMY BIOLOGICAL PHARMACEUTICAL CO., LTD (CN) | 2016-01-14 | — | — | US | claimed |
| US-20150297586-A1 | USE OF BENZO FIVE-MEMBERED NITROGEN HETEROCYCLIC PIPERAZINE OR PIPERIDINE DERIVATIVES | Liaoning Emmy Biological Pharmaceutical Co., Ltd. (CN) | 2015-10-22 | — | — | US | claimed |
| US-20240231226-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20240210823-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-12013636-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-18 | — | — | US | disclosed |
| US-20240142872-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-02 | — | — | US | disclosed |
| US-20240004289-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-01-04 | — | — | US | disclosed |
| US-20230418159-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-28 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20150297586-A1 | USE OF BENZO FIVE-MEMBERED NITROGEN HETEROCYCLIC PIPERAZINE OR PIPERIDINE DERIVATIVES | Liaoning Emmy Biological Pharmaceutical Co., Ltd. (CN) | 2015-10-22 | — | — | US | disclosed |
| US-8858814-B2 | Photomask blank, processing method, and etching method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-20140248563-A1 | COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER | JSR CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| CN-101846876-B | Photomask blank, processing method, and etching method | SHIN ETSU EHEMICAL CO LTD | 2013-06-05 | — | — | CN | disclosed |
| US-20100248493-A1 | PHOTOMASK BLANK, PROCESSING METHOD, AND ETCHING METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-30 | — | — | US | disclosed |
| EP-2233975-A2 | Photomask blank, processing method, and etching method | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-09-29 | — | — | EP | disclosed |
| CN-101846876-A | Photomask blank, processing method, and etching method | SHINETSU CHEMICAL CO | 2010-09-29 | — | — | CN | disclosed |
| US-6855714-B2 | 1-alkyl-2-aryl-benzimidazole derivatives, their use for the production of pharmaceutical agents as well as pharmaceutical preparations that contain these derivatives | SCHERING AKTIENGESELLSCHAFT (DE) | 2005-02-15 | — | — | US | disclosed |
| US-20030055057-A1 | 1-alkyl-2-aryl-benzimidazole derivatives, their use for the production of pharmaceutial agents as well as pharmaceutical preparations that contain these derivatives | SCHERING AG (DE) | 2003-03-20 | — | — | US | disclosed |