Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.42 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | DNM1 | Q05193 | 5/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.33 |
| ▸ | FAAH | O00519 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7634048 | 0.78 | TSHR (0.47) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL29139973 | 0.76 | TSHR (0.44) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL4629786 | 0.74 | — | — | |
| SCHEMBL18991177 | 0.72 | EPHX1 (0.46) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL7515018 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL17629227 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL561270 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL15655834 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL15658064 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 | |
| SCHEMBL15657098 | 0.71 | TSHR (0.53) | TSHRTHRBEPHX1DNM1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114388427-A | Method and system for forming silicon nitride on sidewalls of features | ASM IP私人控股有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-107794515-B | Method for protecting a layer by forming an ultra-thin hydrocarbon-based film | ASM IP控股有限公司 | 2021-06-22 | — | — | CN | claimed |
| CN-107794515-A | By forming the method protected based on the ultrathin membrane of hydrocarbon to layer | ASM IP控股有限公司 | 2018-03-13 | — | — | CN | claimed |
| CN-113249706-B | Methods for depositing gap-fill fluids and related systems and apparatus | ASM IP私人控股有限公司 | 2025-04-04 | — | — | CN | disclosed |
| CN-110176392-B | Spacer-defined direct patterning method in semiconductor fabrication | ASM IP控股有限公司 | 2024-09-10 | — | — | CN | disclosed |
| CN-108122739-B | Method of topologically limited plasma enhanced cyclical deposition | ASM IP控股有限公司 | 2023-07-21 | — | — | CN | disclosed |
| CN-114388427-A | Method and system for forming silicon nitride on sidewalls of features | ASM IP私人控股有限公司 | 2022-04-22 | — | — | CN | disclosed |
| CN-108728824-B | Method for plasma-assisted cyclic deposition using ramp-down flow of reactant gas | ASM IP控股有限公司 | 2022-01-11 | — | — | CN | disclosed |
| CN-107794515-B | Method for protecting a layer by forming an ultra-thin hydrocarbon-based film | ASM IP控股有限公司 | 2021-06-22 | — | — | CN | disclosed |
| CN-110176392-A | The direct patterning method that spacer in semiconductors manufacture limits | ASM IP控股有限公司 | 2019-08-27 | — | — | CN | disclosed |
| CN-108728824-A | The method for carrying out plasmaassisted cyclic deposition using the reaction gas of oblique deascension flow | ASM IP控股有限公司 | 2018-11-02 | — | — | CN | disclosed |
| CN-107794515-A | By forming the method protected based on the ultrathin membrane of hydrocarbon to layer | ASM IP控股有限公司 | 2018-03-13 | — | — | CN | disclosed |