SCHEMBL28210344

SCHEMBL28210344

CCN(OS(=O)(=O)c1c(C)cc(C)cc1C)C(=O)C(C)=O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.42
ALDH1A1 P00352 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 3/20 0.41
MAPT P10636 3/20 0.41
LMNA P02545 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
HPGD P15428 2/20 0.39
MAPK1 P28482 1/20 0.38
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
MMP1 P03956 1/20 0.37
MMP2 P08253 1/20 0.37
MMP9 P14780 1/20 0.37
MMP8 P22894 1/20 0.37
MMP13 P45452 1/20 0.37
RAB9A P51151 1/20 0.35
KEAP1 Q14145 3/20 0.34
NFE2L2 Q16236 3/20 0.34
F2 P00734 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7800456 0.88 KMT2A (0.44) KMT2AALDH1A1KDM4EMEN1MAPT
SCHEMBL28239200 0.78 APP (0.40) KMT2AALDH1A1KDM4ELMNAKEAP1
SCHEMBL28226853 0.71 KMT2A (0.41) KMT2AALDH1A1KDM4EMEN1MAPT
SCHEMBL28728906 0.70
SCHEMBL1662536 0.70 MAPT (0.43) KMT2AALDH1A1MEN1MAPTLMNA
SCHEMBL5075060 0.67 MEN1 (0.44) KMT2AALDH1A1MEN1MAPTLMNA
SCHEMBL3976134 0.66 F2 (0.44) KMT2AALDH1A1MEN1MAPTLMNA
SCHEMBL29082277 0.66 MAPT (0.51) KMT2AALDH1A1MEN1MAPTLMNA
SCHEMBL2678329 0.65 CA1 (0.50) KMT2AALDH1A1MEN1MAPTLMNA
SCHEMBL14736112 0.65 MAPT (0.54) KMT2AALDH1A1MEN1MAPTLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116143708-A Polysubstituted benzazepine heteroaryl derivative and application thereof 四川汇宇制药股份有限公司 2023-05-23 CN disclosed
CN-115536776-A Resin for photoresist, preparation method thereof and photoresist prepared from resin 瑞红(苏州)电子化学品股份有限公司 2022-12-30 CN disclosed
CN-108290903-B Novel macrocyclic sulfondiimine compounds 拜耳医药股份有限公司 2021-09-03 CN disclosed
CN-108530315-A O- substituted hydroxylamine hydrochlorides and preparation method thereof 苏州昊帆生物股份有限公司 2018-09-14 CN disclosed
CN-107954999-A Han oxadiazole rings compound, preparation method, intermediate, composition and application 上海医药集团股份有限公司 2018-04-24 CN disclosed