⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6397397 | 0.75 | — | — | |
| SCHEMBL283138 | 0.63 | — | — | |
| SCHEMBL8497365 | 0.63 | — | — | |
| SCHEMBL910617 | 0.60 | — | — | |
| SCHEMBL11743603 | 0.59 | — | — | |
| SCHEMBL4263886 | 0.59 | — | — | |
| SCHEMBL911061 | 0.53 | — | — | |
| SCHEMBL21048243 | 0.52 | — | — | |
| SCHEMBL163446 | 0.50 | — | — | |
| SCHEMBL2150283 | 0.50 | ALDH1A1 (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1083 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10295907-B2 | Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-05-21 | — | — | US | claimed |
| CN-107849075-A | A kind of phosphoramidate prodrug of nucleoside analog and its application | 四川海思科制药有限公司 | 2018-03-27 | — | — | CN | claimed |
| US-12044968-B2 | Protective film-forming composition having acetal structure and amide structure | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-23 | — | — | US | disclosed |
| EP-4401115-A1 | METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND COMPOSITION FOR EXFOLIATION AND DISSOLUTION | Nissan Chemical Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| CN-118355328-A | Composition for forming resist underlayer film comprising polymer containing polycyclic aromatic group | 日产化学株式会社 | 2024-07-16 | — | — | CN | disclosed |
| CN-118339251-A | Release agent, adhesive composition, laminate, and method for producing semiconductor substrate | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| CN-118339515-A | Composition for forming resist underlayer film having hydroxycinnamic acid derivative | 日产化学株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-20240231230-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| EP-4397623-A1 | EPOXY GROUP-CONTAINING ORGANOSILICA SOL, EPOXY RESIN COMPOSITION AND PRODUCTION METHOD THEREOF | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| EP-4398285-A1 | ADHESIVE COMPOSITION, MULTILAYER BODY, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE | Nissan Chemical Corporation (JP) | 2024-07-10 | — | — | EP | disclosed |
| CN-118318208-A | Composition for forming catechol-containing drug solution resistant protective film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-2085822-A1 | PROCESS FOR SEMICONDUCTOR DEVICE PRODUCTION USING UNDER-RESIST FILM CURED BY PHOTOCROSSLINKING | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 2009-08-05 | — | — | EP | disclosed |
| EP-2085435-A1 | ORGANOSOL OF FLUORIDE COLLOID PARTICLE AND METHOD FOR PRODUCTION THEREOF | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| CN-101429200-A | Tricyclic benzopyran compound as anti-arrhythmic agents | NISSAN CHEMICAL IND LTD (JP) | 2009-05-13 | — | — | CN | disclosed |
| US-20090030248-A1 | Ethynylphenylbiadamantane derivatives | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-2014636-A1 | Ethynylphenylbiadamantane derivatives | Daicel Chemical Industries, Ltd. (JP) | 2009-01-14 | — | — | EP | disclosed |
| CN-101076519-A | Amide compound and thrombopoietin receptor activator | NISSAN CHEMICAL IND LTD (JP) | 2007-11-21 | — | — | CN | disclosed |
| CN-101067068-A | Light resistant primer composition, light emitting semiconductor device and method of producing the same | SHINETSU CHEMICAL CO (JP) | 2007-11-07 | — | — | CN | disclosed |
| CN-1934116-A | Tricyclic benzopyran compounds useful as antiarrhythmic agents | NISSAN CHEMICAL IND LTD (JP) | 2007-03-21 | — | — | CN | disclosed |