Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL28279786

N.Nc1ccc(N)c([N+](=O)[O-])c1.Nc1ccc(N)c([N+](=O)[O-])c1.Nc1ccc([N+](=O)[O-])c(N)c1.Nc1ccc([N+](=O)[O-])cc1N.Nc1ccc([N+](=O)[O-])cc1N

nearest known ligand 0.67

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.67
TDP1 Q9NUW8 5/20 0.67
TSHR P16473 4/20 0.67
CYP3A4 P08684 4/20 0.67
ALOX15 P16050 2/20 0.67
MEN1 O00255 4/20 0.49
MAPT P10636 4/20 0.49
KMT2A Q03164 4/20 0.49
POLB P06746 1/20 0.49
MAPK1 P28482 2/20 0.46
GAA P10253 1/20 0.46
THRB P10828 1/20 0.46
RECQL P46063 1/20 0.46
HSD17B10 Q99714 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
LMNA P02545 2/20 0.44
RAB9A P51151 1/20 0.44
TLR9 Q9NR96 1/20 0.44
GPR35 Q9HC97 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28866079 0.98 ALDH1A1 (0.69) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL3102562 0.94 TDP1 (0.76) ALDH1A1TDP1TSHRCYP3A4ALOX15
Hydrochloric Acid SCHEMBL28284546 0.92 TDP1 (0.73) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL5489713 0.92 TDP1 (0.79) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL31553358 0.83 TDP1 (0.73) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL2867570 0.83 TDP1 (0.73) ALDH1A1TDP1TSHRCYP3A4ALOX15
Hydrochloric Acid SCHEMBL28120789 0.82 ALDH1A1 (0.92) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL121896 0.82 TDP1 (1.00) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL29378383 0.82 TDP1 (1.00) ALDH1A1TDP1TSHRCYP3A4ALOX15
SCHEMBL78083 0.82 ALDH1A1 (1.00) ALDH1A1TDP1TSHRCYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109475758-A Cosmetic composition comprising cured organosilicon material 美国陶氏有机硅公司 2019-03-15 CN disclosed