SCHEMBL28280403

SCHEMBL28280403

CCC(=O)CC(=O)OC.[Zr]

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGAM O43451 2/20 0.50
GAA P10253 2/20 0.50
SI P14410 2/20 0.50
MGAM2 Q2M2H8 2/20 0.50
TSHR P16473 4/20 0.48
TDP1 Q9NUW8 2/20 0.47
HSD17B10 Q99714 2/20 0.43
LMNA P02545 2/20 0.39
KDM4E B2RXH2 1/20 0.39
ALDH1A1 P00352 4/20 0.38
POLB P06746 1/20 0.36
POLA1 P09884 1/20 0.36
KMT2A Q03164 2/20 0.36
TET2 Q6N021 1/20 0.36
MEN1 O00255 1/20 0.36
CA12 O43570 1/20 0.34
CA14 Q9ULX7 1/20 0.34
RECQL P46063 1/20 0.34
FFAR3 O14843 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4604 0.97
SCHEMBL27939823 0.94 MGAM (0.50) MGAMGAASIMGAM2TSHR
Nitrogen SCHEMBL28396370 0.92 MGAM (0.48) MGAMGAASIMGAM2TSHR
SCHEMBL10485430 0.92 MGAM (0.48) MGAMGAASIMGAM2TSHR
SCHEMBL30366354 0.84 TSHR (0.50) MGAMGAASIMGAM2TSHR
SCHEMBL27976 0.82 MGAM (0.61) MGAMGAASIMGAM2TSHR
SCHEMBL28368816 0.80 TDP1 (0.50) MGAMGAASIMGAM2TSHR
SCHEMBL15688315 0.79 MGAM (0.58) MGAMGAASIMGAM2TSHR
SCHEMBL28365184 0.79 GAA (0.67) MGAMGAASIMGAM2TSHR
SCHEMBL13916177 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109476811-A One-part low temperature cure coating formed via a dual layer cure mechanism 巴斯夫涂料有限公司 2019-03-15 CN disclosed
CN-109476933-A The low temperature solidification coating formed via the water base base of coloring and the double-deck curing mechanism of solvent base top layer 巴斯夫涂料有限公司 2019-03-15 CN disclosed