Fenchyl Alcohol

Fenchyl Alcohol

SCHEMBL2828537

C=C(C)C(=O)OCC.CC1(C)C(O)[C@@]2(C)CC[C@@H]1C2

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
GPR84 Q9NQS5 1/20 0.38
CYP2D6 P10635 2/20 0.36
CYP2C19 P33261 2/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
THRB P10828 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
LMNA P02545 1/20 0.35
F10 P00742 1/20 0.33
EPHX2 P34913 1/20 0.33
TSHR P16473 4/20 0.33
TAS1R3 Q7RTX0 2/20 0.31
TAS1R2 Q8TE23 1/20 0.31
TAS1R1 Q7RTX1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3692737 0.81 CYP3A4 (0.43) ALDH1A1GPR84CYP2D6CYP2C19CYP3A4
SCHEMBL13445840 0.81 CYP3A4 (0.43) ALDH1A1GPR84CYP2D6CYP2C19CYP3A4
SCHEMBL4941894 0.77 CYP3A4 (0.50) ALDH1A1GPR84CYP2D6CYP2C19CYP3A4
SCHEMBL17973525 0.77 CYP3A4 (0.45) ALDH1A1GPR84CYP2D6CYP2C19CYP3A4
Fenchyl Alcohol SCHEMBL8182336 0.76 GPR84 (0.42) GPR84CYP2D6CYP2C19CYP3A4CYP2C9
Fenchyl Alcohol SCHEMBL58038 0.75 GPR84 (0.43) GPR84CYP2D6CYP2C19CYP3A4CYP2C9
Fenchyl Alcohol SCHEMBL31196741 0.75 GPR84 (0.43) GPR84CYP2D6CYP2C19CYP3A4CYP2C9
Fenchyl Alcohol SCHEMBL21155381 0.75 GPR84 (0.43) GPR84CYP2D6CYP2C19CYP3A4CYP2C9
Fenchyl Alcohol SCHEMBL20574452 0.75 GPR84 (0.43) GPR84CYP2D6CYP2C19CYP3A4CYP2C9
Fenchyl Alcohol SCHEMBL1245968 0.75 GPR84 (0.43) GPR84CYP2D6CYP2C19CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7700256-B2 Phenolic/alicyclic copolymers and photoresists ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-04-20 US disclosed
US-7309750-B2 Cyanoadamantyl compounds and polymers ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-12-18 US disclosed
US-7270935-B2 Cyanoadamantyl compounds and polymers and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2007-09-18 US disclosed
US-7090968-B2 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. (US) 2006-08-15 US disclosed
EP-1586944-A1 Cyanoadamantyl compounds and polymers Rohm and Haas Electronic Materials, L.L.C. (US) 2005-10-19 EP disclosed
WO-2005086901-A2 CYNOADAMANTYL COMPOUND AND POLYMERS AND PHOTORESISTS COMPRESING SAME ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-09-22 WO disclosed
US-20050208418-A1 Cyanoadamantyl compounds and polymers ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-09-22 US disclosed
US-20050208417-A1 Cyanoadamantyl compounds and polymers and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-09-22 US disclosed
EP-1574903-A1 Photoresists comprising cyanoadamantyl moiety-containing polymers Rohm and Haas Electronic Materials, L.L.C. (US) 2005-09-14 EP disclosed
US-20040076906-A1 Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same SHIPLEY COMPANY, L.L.C. 2004-04-22 US disclosed
US-6692888-B1 TERPOLYMER OF SUCH AS 2-METHYLADAMANTANYL METHACRYLATE, METHACRYLONITRILE AND ALPHA-BUTYROLACTONE METHACRYLATE; SHORT WAVELENGTH IMAGING; PLASMA ETCHANT RESISTANCE SHIPLEY COMPANY, L.L.C. 2004-02-17 US disclosed
US-20030207200-A1 Phenolic/alicyclic copolymers and photoresists SHIPLEY COMPANY, L.L.C. (US) 2003-11-06 US disclosed
US-6492086-B1 TERPOLYMERS OF M- AND P-HYDROXYSTYRENE AND ACRYLIC ESTER OF ALKYLADAMANTYL, ETHYLFENCYL, TRICYCLO DECANYL, OR PINANYL GROUP; IMAGING AT SHORT WAVELENGTHS; HIGH RESOLUTION RELIEF IMAGES SHIPLEY COMPANY, L.L.C. 2002-12-10 US disclosed
EP-1091249-A1 Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same Shipley Company LLC (US) 2001-04-11 EP disclosed
EP-1091250-A1 Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same Shipley Company LLC (US) 2001-04-11 EP disclosed