⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15133931 | 0.69 | — | — | |
| SCHEMBL7733900 | 0.69 | — | — | |
| SCHEMBL7733897 | 0.69 | — | — | |
| SCHEMBL7736644 | 0.67 | — | — | |
| SCHEMBL7736483 | 0.67 | — | — | |
| SCHEMBL20972840 | 0.65 | — | — | |
| SCHEMBL15114437 | 0.62 | — | — | |
| SCHEMBL347823 | 0.62 | — | — | |
| SCHEMBL28328659 | 0.62 | — | — | |
| SCHEMBL23163 | 0.60 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109796981-B | Etching gas mixture, pattern forming method and integrated circuit device manufacturing method | 三星电子株式会社 | 2022-11-22 | — | — | CN | disclosed |
| CN-109796981-A | Etchant gas mixture, pattern forming method and IC apparatus manufacturing method | 三星电子株式会社 | 2019-05-24 | — | — | CN | disclosed |