Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.56 |
| ▸ | EGLN1 | Q9GZT9 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | LDHA | P00338 | 1/20 | 0.30 |
| ▸ | LDHB | P07195 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10542559 | 0.85 | ALDH1A1 (0.79) | TDP1ALDH1A1EGLN1LMNAALOX15 | |
| SCHEMBL375516 | 0.84 | — | — | |
| Methacrylic Acid SCHEMBL28100454 | 0.84 | ALDH1A1 (0.68) | TDP1ALDH1A1EGLN1LMNAALOX15 | |
| Carbamic Acid SCHEMBL9013721 | 0.80 | ALDH1A1 (0.79) | TDP1ALDH1A1EGLN1LMNAALOX15 | |
| Methoxymethane SCHEMBL2353557 | 0.79 | — | — | |
| Ethylenediamine SCHEMBL27839508 | 0.78 | ALDH1A1 (0.46) | ALDH1A1EGLN1LMNATSHR | |
| Urea SCHEMBL27927210 | 0.77 | ALDH1A1 (0.83) | TDP1ALDH1A1EGLN1LMNAALOX15 | |
| Hydrogen Peroxide SCHEMBL9143793 | 0.76 | — | — | |
| Bicarbonate SCHEMBL1415130 | 0.76 | TDP1 (0.86) | TDP1ALDH1A1LMNAALOX15BLM | |
| SCHEMBL17842489 | 0.76 | TDP1 (0.86) | TDP1ALDH1A1LMNAALOX15BLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107903156-B | Photosensitive composite and compound | 东京应化工业株式会社 | 2019-05-31 | — | — | CN | disclosed |