Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL28300034

CCCCCCCC(CCCC)c1ccc(S(=O)(=O)O)cc1.N

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR1I2 O75469 1/20 0.60
S1PR3 Q99500 2/20 0.41
MMP9 P14780 2/20 0.39
MMP13 P45452 2/20 0.39
ADAM17 P78536 2/20 0.39
MMP1 P03956 2/20 0.39
TP53 P04637 1/20 0.39
CNR2 P34972 1/20 0.38
CA2 P00918 4/20 0.38
MMP2 P08253 1/20 0.37
MMP3 P08254 1/20 0.37
CA1 P00915 1/20 0.37
CA4 P22748 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
S1PR2 O95136 1/20 0.37
S1PR1 P21453 1/20 0.37
NAAA Q02083 2/20 0.36
LMNA P02545 1/20 0.36
KDM2B Q8NHM5 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14801970 0.98 NR1I2 (0.61) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL19627843 0.98 NR1I2 (0.61) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL16324578 0.97 NR1I2 (0.60) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL16076634 0.97 NR1I2 (0.59) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL4310857 0.97 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL27214770 0.97 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL19627845 0.97 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL6128184 0.97 NR1I2 (0.63) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL15936841 0.94 NR1I2 (0.60) NR1I2S1PR3MMP9MMP13ADAM17
SCHEMBL1048442 0.91 NR1I2 (0.73) NR1I2S1PR3MMP9MMP13ADAM17

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110609443-A Photoresist compound 台湾积体电路制造股份有限公司 2019-12-24 CN disclosed
CN-110609441-A Method for forming photoresist pattern 台湾积体电路制造股份有限公司 2019-12-24 CN disclosed
CN-109782553-A Photoresist developer 台湾积体电路制造股份有限公司 2019-05-21 CN disclosed