SCHEMBL28318239

SCHEMBL28318239

C=CCC(CC)NC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9606767 1.00
SCHEMBL20565058 0.86
Hydrochloric Acid SCHEMBL21195073 0.83 TSHR (0.30)
SCHEMBL1454707 0.79
SCHEMBL23589684 0.77
SCHEMBL210662 0.77
SCHEMBL210661 0.77
Hydrochloric Acid SCHEMBL211031 0.75
SCHEMBL8846437 0.75 LMNA (0.31)
Hydrochloric Acid SCHEMBL211030 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107532294-B Raw material for chemical vapor deposition comprising organic platinum compound and chemical vapor deposition method using same 田中贵金属工业株式会社 2019-09-13 CN disclosed