Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | DAO | P14920 | 1/20 | 0.32 |
| ▸ | MAOA | P21397 | 1/20 | 0.30 |
| ▸ | MAOB | P27338 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9877840 | 0.93 | — | — | |
| SCHEMBL83479 | 0.82 | — | — | |
| SCHEMBL11317051 | 0.82 | — | — | |
| SCHEMBL83478 | 0.82 | — | — | |
| SCHEMBL8861127 | 0.82 | — | — | |
| SCHEMBL3537331 | 0.82 | — | — | |
| SCHEMBL21995884 | 0.82 | SLC6A3 (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL31091382 | 0.80 | — | — | |
| SCHEMBL16295307 | 0.77 | MAPK1 (0.36) | — | |
| SCHEMBL26107454 | 0.76 | CA1 (0.39) | KMT2AMAOAMAOBCA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0694521-B1 | Ketotricyclo(5.2.1.0)decane derivatives | MERCK PATENT GMBH (DE) | 1998-01-21 | — | — | EP | claimed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| US-7309750-B2 | Cyanoadamantyl compounds and polymers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-12-18 | — | — | US | disclosed |
| US-7270935-B2 | Cyanoadamantyl compounds and polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-18 | — | — | US | disclosed |
| US-7208261-B2 | Polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-24 | — | — | US | disclosed |
| US-7105266-B2 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-09-12 | — | — | US | disclosed |
| US-7090968-B2 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-08-15 | — | — | US | disclosed |
| EP-1210650-A4 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY CO LLC (US) | 2006-05-03 | — | — | EP | disclosed |
| US-7022454-B2 | Monomers, polymers, methods of synthesis thereof and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2006-04-04 | — | — | US | disclosed |
| WO-2001086353-A9 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY CO LLC (US) | 2005-10-27 | — | — | WO | disclosed |
| WO-2002069038-A2 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| EP-1210650-A1 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | Shipley Company LLC (US) | 2002-06-05 | — | — | EP | disclosed |
| US-20020013448-A1 | Novel monomers, polymers, methods of synthesis thereof and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2002-01-31 | — | — | US | disclosed |
| WO-2001086353-A1 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2001-11-15 | — | — | WO | disclosed |
| US-6306554-B1 | PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES A PHOTOACID-LABILE MOIETY AND STRUCTURE CONTAINING OXYGEN AND/OR SULFUR ALICYCLIC UNITS AND CARBON ALICYCLIC UNITS | SHIPLEY COMPANY, L.L.C. | 2001-10-23 | — | — | US | disclosed |
| EP-1127870-A1 | Novel monomers, polymers, methods of synthesis thereof and photoresist compositions | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| US-5403959-A | Reacting tricyclo (5.2.102.6)decan-8(9)-one with dialkylamine in presence of hydrogen and platinum-containing supported catalyst | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-04-04 | — | — | US | disclosed |