Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.65 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.65 |
| ▸ | DHFR | P00374 | 5/20 | 0.49 |
| ▸ | TYMS | P04818 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.47 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.40 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.38 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29850929 | 1.00 | ESR1 (0.65) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL21946436 | 0.90 | ESR1 (0.54) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL170122 | 0.88 | ESR1 (0.51) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL3879785 | 0.86 | ESR1 (0.50) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL1324119 | 0.83 | ESR1 (0.71) | ESR1ESR2TYMSMEN1KMT2A | |
| SCHEMBL29375514 | 0.83 | ESR1 (0.71) | ESR1ESR2TYMSMEN1KMT2A | |
| SCHEMBL2029878 | 0.81 | AKR1C1 (0.57) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL29967186 | 0.81 | AKR1C1 (0.57) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL14199332 | 0.79 | ESR1 (0.56) | ESR1ESR2DHFRTYMSMEN1 | |
| SCHEMBL217779 | 0.79 | ESR1 (0.65) | ESR1ESR2DHFRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103619581-B | Flexible display substrate | KOLON INDUSTRIES, INC. (KR) | 2015-11-25 | — | — | CN | claimed |
| CN-103619581-A | Flexible display substrate | KOLON INC | 2014-03-05 | — | — | CN | claimed |
| US-10605433-B2 | Wavelength conversion member, backlight unit, image display device, and method of manufacturing wavelength conversion member | FUJIFILM CORPORATION (JP) | 2020-03-31 | — | — | US | disclosed |
| US-10591816-B2 | Photosensitive resin composition, color filter, and liquid crystal display element thereof | CHI MEI CORPORATION (TW) | 2020-03-17 | — | — | US | disclosed |
| US-20190049780-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND MANUFACTURING METHOD OF THE SAME, BLACK MATRIX, PIXEL LAYER, PROTECTION FILM, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY APPARATUS | CHI MEI CORPORATION (TW) | 2019-02-14 | — | — | US | disclosed |
| US-10088612-B2 | Alkali-soluble resin, photosensitive resin composition for color filter containing the same and uses thereof | CHI MEI CORPORATION (TW) | 2018-10-02 | — | — | US | disclosed |
| US-9939568-B2 | Photosensitive resin composition for color filter and application of the same | CHI MEI CORPORATION (TW) | 2018-04-10 | — | — | US | disclosed |
| US-20170328541-A1 | WAVELENGTH CONVERSION MEMBER, BACKLIGHT UNIT, IMAGE DISPLAY DEVICE, AND METHOD OF MANUFACTURING WAVELENGTH CONVERSION MEMBER | FUJIFILM CORPORATION (JP) | 2017-11-16 | — | — | US | disclosed |
| US-20170235224-A1 | PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF | CHI MEI CORPORATION (TW) | 2017-08-17 | — | — | US | disclosed |
| US-9632229-B2 | Optical film, barrier film, light conversion member, backlight unit, and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2017-04-25 | — | — | US | disclosed |
| US-9625814-B2 | Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-04-18 | — | — | US | disclosed |
| US-6589672-B1 | Photosensitive resin; and cyanine dye having excellent blue color purity | FUJI ELECTRIC CO., LTD (JP) | 2003-07-08 | — | — | US | disclosed |
| US-20020103270-A1 | Photo- or heat-curable resin composition and multilayer printed wiring board | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2002-08-01 | — | — | US | disclosed |
| US-20020051942-A1 | Photo-or heat-curable resin composition and multilayer printed wiring board | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| EP-0646845-B1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | NIPPON STEEL CORP (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-6051294-A | RETORT-STERILIZABLE PACKAGING MATERIALS EXHIBITING HIGH BARRIER TO OXYGEN | THE DOW CHEMICAL COMPANY (US) | 2000-04-18 | — | — | US | disclosed |
| US-5814373-A | PACKAGING OF OXYGEN SENSITIVE MATERIALS INSIDE A CONTAINER COMPRISING A THERMOPLASTIC POLYMER | DOW CHEMICAL COMPANY (US) | 1998-09-29 | — | — | US | disclosed |
| US-5721076-A | A PHOTO OR THERMAL CURABLE, ALKALI-DEVELOPABLE PHOTOSENSITIVE POLYESTER MONOMERS CONTAINING ACRYLATED BISPHENOL EPOXY COMPOUNDS AND MONOANHYDIDE OR DIANHYDRIDE COMPOUNDS; | NIPPON STEEL CORPORATION (JP) | 1998-02-24 | — | — | US | disclosed |
| US-5710234-A | POLYORTHOESTERS FOR MOLDING MATERIALS, ADHESIVES AND HEAT RESISTANT POLYMERS | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 1998-01-20 | — | — | US | disclosed |
| EP-0646845-A1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | Nippon Steel Corporation (JP) | 1995-04-05 | — | — | EP | disclosed |