Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.65 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.65 |
| ▸ | DHFR | P00374 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 4/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | LMNA | P02545 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.47 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | JAK2 | O60674 | 1/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 7/20 | 0.38 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.36 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.36 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29703330 | 1.00 | ESR1 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL172120 | 0.88 | ESR1 (0.51) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL1324119 | 0.83 | ESR1 (0.71) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL29375514 | 0.83 | ESR1 (0.71) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL7917312 | 0.81 | ESR1 (0.50) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL2405956 | 0.79 | MEN1 (0.56) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL70957 | 0.79 | ESR1 (1.00) | ESR1ESR2MEN1KMT2ALMNA | |
| SCHEMBL2837044 | 0.79 | ESR2 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL2832176 | 0.79 | ESR1 (0.65) | ESR1ESR2DHFRMEN1KMT2A | |
| SCHEMBL17722590 | 0.79 | ESR1 (0.60) | ESR1ESR2MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 343 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103619581-B | Flexible display substrate | KOLON INDUSTRIES, INC. (KR) | 2015-11-25 | — | — | CN | claimed |
| CN-103619581-A | Flexible display substrate | KOLON INC | 2014-03-05 | — | — | CN | claimed |
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| EP-4184248-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM | SHINETSU CHEMICAL CO (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4398037-B1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2026-01-21 | — | — | EP | disclosed |
| EP-4239408-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-12441712-B2 | Material for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| US-12443104-B2 | Composition for forming organic film, patterning process, and compound and polymer for forming organic film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-10-14 | — | — | US | disclosed |
| US-20020051942-A1 | Photo-or heat-curable resin composition and multilayer printed wiring board | NIPPON STEEL & SUMIKIN CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-6217995-B1 | TRANSPARENT POLYCARBONATE OR POLYESTERCARABONATE CONTAINING CYCLIC ALIPHATIC GROUP, HAVING A VISIBLE LIGHT TRANSMITTANCE MORE THAN 80% AND A GLASS TRANSITION TEMPERATURE LESS THAN 80 DEGREE C. EXHIBIT BIREFRINGENCE INDEX LESS THAN 15 NM | MITSUBISHI CHEMICAL CORPORATION (JP) | 2001-04-17 | — | — | US | disclosed |
| EP-0646845-B1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | NIPPON STEEL CORP (JP) | 2001-03-14 | — | — | EP | disclosed |
| US-5721076-A | A PHOTO OR THERMAL CURABLE, ALKALI-DEVELOPABLE PHOTOSENSITIVE POLYESTER MONOMERS CONTAINING ACRYLATED BISPHENOL EPOXY COMPOUNDS AND MONOANHYDIDE OR DIANHYDRIDE COMPOUNDS; | NIPPON STEEL CORPORATION (JP) | 1998-02-24 | — | — | US | disclosed |
| US-5710234-A | POLYORTHOESTERS FOR MOLDING MATERIALS, ADHESIVES AND HEAT RESISTANT POLYMERS | NIPPON STEEL CHEMICAL CO., LTD. (JP) | 1998-01-20 | — | — | US | disclosed |
| EP-0646845-A1 | COLOR FILTER, MATERIAL THEREOF AND RESIN | Nippon Steel Corporation (JP) | 1995-04-05 | — | — | EP | disclosed |
| WO-1994024079-A1 | PROCESS FOR THE PREPARATION OF BISPHENOLS | THE DOW CHEMICAL COMPANY (US) | 1994-10-27 | — | — | WO | disclosed |
| US-5304688-A | Reacting a fluorenone with substituted or unsubstituted phenol using mercapto and superacid cocatalysts | THE DOW CHEMICAL COMPANY (US) | 1994-04-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12443104-B2 | Composition for forming organic film, patterning process, and compound and polymer for forming organic film | OR10J3, ICAM1, PYM1 | ESR1 2668/4885ESR2 3814/4885DHFR 4052/4885 |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | F12, MLX, F11 | ESR1 1891/4885ESR2 2260/4885DHFR 4836/4885 |
| US-12441712-B2 | Material for forming organic film, patterning process, and compound | OR10J3, CDH1, EPCAM | ESR1 1396/4885ESR2 3011/4885DHFR 3851/4885 |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | TET2, SDC2, TST | ESR1 1651/4885ESR2 2468/4885DHFR 1963/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.