Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 2/20 | 0.48 |
| ▸ | MLNR | O43193 | 1/20 | 0.48 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.48 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.48 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.48 |
| ▸ | HTR1A | P08908 | 1/20 | 0.48 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.48 |
| ▸ | DRD2 | P14416 | 1/20 | 0.48 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.48 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.48 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.48 |
| ▸ | DRD1 | P21728 | 1/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.48 |
| ▸ | HTR2C | P28335 | 1/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.48 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.48 |
| ▸ | HRH1 | P35367 | 1/20 | 0.48 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.48 |
| ▸ | DRD3 | P35462 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29363404 | 1.00 | HTR2A (0.48) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL28942003 | 0.97 | HTR2A (0.47) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| Benzene SCHEMBL28919541 | 0.97 | PGR (0.48) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL24729587 | 0.97 | HTR2A (0.47) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| Lithium SCHEMBL30363455 | 0.97 | HTR2A (0.47) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL5014621 | 0.89 | HTR2A (0.43) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL5062909 | 0.89 | HTR2A (0.43) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL21759261 | 0.87 | HTR2A (0.46) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL21368848 | 0.86 | KDM4E (0.46) | HTR2AMLNRNR1I2CHRM2ADRB1 | |
| SCHEMBL29607648 | 0.86 | KDM4E (0.46) | HTR2AMLNRNR1I2CHRM2ADRB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3413 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4520775-B1 | NITROGEN-CONTAINING HETEROCYCLIC POLYMER, AND POLYMER FILM AND USE THEREOF | WUHAN LIMO TECH CO LTD (CN) | 2026-05-06 | — | — | EP | claimed |
| EP-4699983-A1 | METHOD FOR MANUFACTURING LITHIUM SILICON OXIDE COMPOSITE | LG Chem, Ltd. (KR) | 2026-02-25 | — | — | EP | claimed |
| US-20250273750-A1 | NEGATIVE CURRENT COLLECTOR AND PREPARATION METHOD THEREOF, NEGATIVE ELECTRODE PLATE, SECONDARY BATTERY, AND ELECTRICAL DEVICE | CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) | 2025-08-28 | — | — | US | claimed |
| US-20250257431-A1 | PRELITHIATED ELECTRODE MATERIAL AND PREPARATION METHOD THEREOF, SECONDARY BATTERY, AND ELECTRICAL DEVICE | CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) | 2025-08-14 | — | — | US | claimed |
| EP-4593123-A1 | NEGATIVE ELECTRODE CURRENT COLLECTOR AND PREPARATION METHOD THEREFOR, NEGATIVE ELECTRODE SHEET, SECONDARY BATTERY, AND ELECTRIC DEVICE | Contemporary Amperex Technology (Hong Kong) Limited (HK) | 2025-07-30 | — | — | EP | claimed |
| US-20250210621-A1 | HIGH PERFORMANCE ANODE ELECTRODE INCLUDING SILICON FILM WITH CONTROLLED PRE-LITHIATION | GM Global Technology Operations LLC | 2025-06-26 | — | — | US | claimed |
| WO-2025105341-A1 | METAL PATTERNING MATERIAL, PENTAFLUOROSULFANYL COMPOUND, METAL PATTERNING THIN FILM, ORGANIC ELECTROLUMINESCENT ELEMENT, ELECTRONIC APPARATUS, AND METAL PATTERN FORMING METHOD | 東ソー株式会社 | 2025-05-22 | — | — | WO | claimed |
| US-20250163224-A1 | POLYMER AND PREPARATION METHOD THEREFOR, AND ANION-EXCHANGE MEMBRANE | Tan Kah Kee Innovation Laboratory (CN) | 2025-05-22 | — | — | US | claimed |
| US-20250154114-A1 | MATERIAL FOR METAL PATTERNING, HETEROCYCLIC COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENT DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN | TOSOH CORPORATION (JP) | 2025-05-15 | — | — | US | claimed |
| US-12297327-B1 | Polymer and preparation method therefor, and anion-exchange membrane | Tan Kah Kee Innovation Laboratory (CN) | 2025-05-13 | — | — | US | claimed |
| US-4595585-A | Hair setting solution | L'OREAL (FR) | 1986-06-17 | — | — | US | claimed |
| EP-0183552-A2 | A photopolymerizable composition | Asahi Kasei Kogyo Kabushiki Kaisha (JP) | 1986-06-04 | — | — | EP | claimed |
| US-4547553-A | CROSSLINKED SOLVENT RESISTANT THERMOPLASTIC RESIN | THE BOEING COMPANY (US) | 1985-10-15 | — | — | US | claimed |
| US-4517283-A | STABILIZED BY POLYALKYLPIPERIDINE COMPOUND AND PHENOL ANTIOXIDANT | CIBA-GEIGY AG (CH) | 1985-05-14 | — | — | US | claimed |
| EP-0114028-A2 | Colour-photographic recording material | CIBA-GEIGY AG (CH) | 1984-07-25 | — | — | EP | claimed |
| US-4426471-A | TETRAALKYLPIPERIDINES | CIBA-GEIGY CORPORATION (US) | 1984-01-17 | — | — | US | claimed |
| EP-0006213-B1 | LIGHT STABILIZATION OF ACID CATALYSED STOVING ENAMELS | CIBA-GEIGY AG (CH) | 1982-09-01 | — | — | EP | claimed |
| US-4344876-A | N-SUBSTITUTED 2,2,6,6-TETRAALYKYL PIPERIDINE PHOTOSTABILIZERS | CIBA-GEIGY CORPORATION (US) | 1982-08-17 | — | — | US | claimed |
| US-4266005-A | Photosensitive elastomeric composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1981-05-05 | — | — | US | claimed |
| EP-0006213-A1 | Light stabilization of acid catalysed stoving enamels | CIBA-GEIGY AG (CH) | 1980-01-09 | — | — | EP | claimed |