SCHEMBL28330767

SCHEMBL28330767

COC(C[Si](Cl)(Cl)Cl)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AOC3 Q16853 4/20 0.36
SLC6A4 P31645 3/20 0.36
SLC6A2 P23975 3/20 0.36
TSHR P16473 2/20 0.36
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP3A4 P08684 1/20 0.36
CYP2D6 P10635 1/20 0.36
CYP2C19 P33261 1/20 0.36
SLC6A3 Q01959 1/20 0.36
HTR2C P28335 1/20 0.35
HTR2B P41595 1/20 0.35
PMP22 Q01453 1/20 0.35
CHRNB2 P17787 1/20 0.34
CHRNA4 P43681 1/20 0.34
POLB P06746 1/20 0.33
HTR2A P28223 1/20 0.33
HRH1 P35367 1/20 0.33
EPHX1 P07099 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1532968 0.81 SLC6A4 (0.38) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL28330761 0.80 SLC6A4 (0.36) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL14584327 0.77 SLC6A4 (0.39) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL1157686 0.77 SLC6A4 (0.39) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL6343043 0.76 SLC6A4 (0.41) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL3342082 0.76 SLC6A4 (0.37) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL1068693 0.74 LMNA (0.48) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL11915432 0.74 LMNA (0.48) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL8269660 0.74 LMNA (0.48) AOC3SLC6A4SLC6A2TSHRKMT2A
SCHEMBL14528138 0.73 SLC6A4 (0.41) AOC3SLC6A4SLC6A2TSHRKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115362216-B Composition for forming film 日产化学株式会社 2024-07-19 CN disclosed
CN-118159910-A Additive-containing silicon-containing resist underlayer film forming composition 日产化学株式会社 2024-06-07 CN disclosed
CN-113518762-B Release layer dispersion of layered compound and transparent substrate using the same 公立大学法人大阪 2024-05-28 CN disclosed
CN-117716295-A Composition for forming silicon-containing resist underlayer film and silicon-containing resist underlayer film 日产化学株式会社 2024-03-15 CN disclosed
CN-117460995-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-26 CN disclosed
CN-117396811-A Composition for forming underlayer film of silicon-containing resist 日产化学株式会社 2024-01-12 CN disclosed
CN-117255971-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-12-19 CN disclosed
CN-106462075-B Composition for forming resist underlayer film containing silicon having phenyl chromophore 日产化学工业株式会社 2019-12-06 CN disclosed