SCHEMBL28330775

SCHEMBL28330775

CCC(COCC1CO1)[SiH](OC)OC

nearest known ligand 0.49

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.49
SMN1; SMN2 Q16637 1/20 0.42
TDP1 Q9NUW8 1/20 0.40
TSHR P16473 2/20 0.39
MAPK1 P28482 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28332138 0.88 ALDH1A1 (0.51) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL7688097 0.83 SMN1; SMN2 (0.47) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL8460322 0.79 ALDH1A1 (0.44) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL28342350 0.78 ALDH1A1 (0.32) ALDH1A1SMN1; SMN2
SCHEMBL28513526 0.76
SCHEMBL28521273 0.75 ALDH1A1 (0.42) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL19125097 0.74 SMN1; SMN2 (0.57) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL13444950 0.74 ALDH1A1 (0.73) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL4347990 0.72 ALDH1A1 (0.56) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1
SCHEMBL3233061 0.71 ALDH1A1 (0.37) ALDH1A1SMN1; SMN2TDP1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117940849-A Wafer edge protection film forming composition for semiconductor manufacturing 日产化学株式会社 2024-04-26 CN disclosed
CN-117396810-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2024-01-12 CN disclosed
CN-117083570-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-11-17 CN disclosed
CN-116547343-A Composition for forming silicon-containing resist underlayer film 日产化学株式会社 2023-08-04 CN disclosed
CN-116457424-A Organosilicon compound, hydrolysis condensate thereof, and coating composition 信越化学工业株式会社 2023-07-18 CN disclosed
CN-106462075-B Composition for forming resist underlayer film containing silicon having phenyl chromophore 日产化学工业株式会社 2019-12-06 CN disclosed