SCHEMBL28335353

SCHEMBL28335353

Cc1cc(C(=O)c2ccc(O)cc2)c(C)c(C)c1C

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
MAPT P10636 4/20 0.50
LMNA P02545 4/20 0.50
HPGD P15428 3/20 0.50
ESR1 P03372 2/20 0.50
ESR2 Q92731 2/20 0.50
PKM P14618 1/20 0.50
LIG1 P18858 1/20 0.47
TDP1 Q9NUW8 2/20 0.44
POLB P06746 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
SRD5A2 P31213 1/20 0.44
ALDH1A1 P00352 3/20 0.44
MAPK1 P28482 2/20 0.44
KDM4E B2RXH2 1/20 0.44
CYP3A4 P08684 1/20 0.44
RECQL P46063 1/20 0.44
HSD17B10 Q99714 1/20 0.44
KMT2A Q03164 4/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10439590 0.84 MAPT (0.42) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL310387 0.83 AKR1C3 (0.48) HTTMAPTLMNAHPGDTDP1
SCHEMBL28430812 0.81 MAPT (0.58) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL28396124 0.81 CDC25B (0.54) SMN1; SMN2MAPTLMNAHPGDPOLB
SCHEMBL11016647 0.79 HTT (0.56) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL1758224 0.79 HTT (0.60) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL30355061 0.79 HTT (0.60) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL18241775 0.78 HTT (0.55) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL7768455 0.77 HTT (0.75) HTTSMN1; SMN2MAPTLMNAHPGD
SCHEMBL9544691 0.76 HTT (0.56) HTTSMN1; SMN2MAPTLMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110582727-B Negative resist formulation for producing undercut pattern profile 默克专利股份有限公司 2023-09-22 CN disclosed
CN-110582727-A Negative resist formulation for producing undercut pattern profiles 默克专利股份有限公司 2019-12-17 CN disclosed