SCHEMBL2834102

SCHEMBL2834102

NC(N)C12CCC(CC1)C2

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
SLC22A2 O15244 1/20 0.39
SLC47A1 Q96FL8 1/20 0.39
MAPT P10636 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL191884 0.72 GRIN2D (0.41) SLC22A2SLC47A1MAPT
SCHEMBL1054419 0.72
SCHEMBL3666801 0.72
SCHEMBL3061818 0.72
SCHEMBL1324526 0.72
SCHEMBL5988117 0.72 GRM1 (0.45)
Hydrochloric Acid SCHEMBL5987774 0.71 GRM1 (0.44) MAPT
SCHEMBL1200520 0.71 SLC22A2 (0.62) SLC22A2SLC47A1MAPT
SCHEMBL25075855 0.69 DPP4 (0.34) SLC22A2SLC47A1MAPT
SCHEMBL7079241 0.69 DPP4 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 176 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180256923-A1 SYSTEMS AND KITS FOR USER CUSTOMIZABLE COSMETICS, AND METHODS FOR THE PREPARATION OF USER CUSTOMIZED COSMETICS UNGVARSKY VANESSA (US) 2018-09-13 US claimed
EP-1321487-B1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE MITSUI CHEMICALS INC (JP) 2008-02-27 EP claimed
EP-0885910-B1 Aliphatic polyamines as curing agents for epoxy resins TORAY INDUSTRIES (JP) 2006-03-01 EP claimed
EP-0885930-B1 Impact-resistant polyamide compositions INVENTA AG (CH) 2004-12-22 EP claimed
US-6734276-B2 RANDOM COPOLYMER WITH UNITS DERIVED FROM PYROMELLITIC ACID, P-PHENYLENEDIAMINE, AND AT LEAST ONE OF M-PHENYLENEDIAMINE, BIS(P-AMINOPHENYL) ETHER, AND DIAMINOMETHYLNORBORNANE; LINEAR EXPANSION COEFFICIENT; SHRINKAGE INHIBITION MITSUI CHEMICALS, INC. (JP) 2004-05-11 US claimed
US-6710160-B2 VARNISH HAVING IMPROVED SMOOTHNESS, THERMAL RESISTANCE, MELT FLOWABILITY, OPTICAL PROPERTIES AND CHEMICAL RESISTANCE; DIELECTRICS MITSUI CHEMICALS, INC. (JP) 2004-03-23 US claimed
EP-1321487-A1 POLYAMIC ACID, POLYIMIDE, PROCESS FOR PRODUCING THESE, AND FILM OF THE POLYIMIDE Mitsui Chemicals, Inc. (JP) 2003-06-25 EP claimed
US-20030013838-A1 Novel polyimide and circuit substrate comprising the same MITSUI CHEMICALS, INC. (JP) 2003-01-16 US claimed
US-20020188090-A1 Polyamic acid, polyimide, process for producing these, and film of the polyimide MITSUI CHEMICALS, INC. (JP) 2002-12-12 US claimed
EP-1236756-A1 NOVEL POLYIMIDE AND CIRCUIT SUBSTRATE COMPRISING THE SAME Mitsui Chemicals, Inc. (JP) 2002-09-04 EP claimed
JP-2840098-B2 1998-12-24 JP claimed
EP-0885930-A1 Impact-resistant polyamide compositions EMS-INVENTA AG (CH) 1998-12-23 EP claimed
EP-0328325-B1 Laminar polymeric sheet RAYCHEM LTD (GB) 1994-09-21 EP claimed
EP-0327398-B1 Laser-machining polymers RAYCHEM LTD (GB) 1994-09-21 EP claimed
US-5194316-A LAMINAR POLYMERIC SHEET RAYCHEM LIMITED (GB) 1993-03-16 US claimed
EP-0366700-B1 ELECTRICAL WIRE RAYCHEM LIMITED (GB) 1993-01-27 EP claimed
EP-0400070-A1 LASER-MACHINING POLYMERS RAYCHEM LIMITED (GB) 1990-12-05 EP claimed
EP-0328325-A1 Laminar polymeric sheet RAYCHEM LIMITED (GB) 1989-08-16 EP claimed
WO-1989007337-A1 LASER-MACHINING POLYMERS RAYCHEM LIMITED (GB) 1989-08-10 WO claimed
EP-0085379-A2 Cold-setting filler, coating and putty composition HOECHST AKTIENGESELLSCHAFT (DE) 1983-08-10 EP claimed