Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2D | O15399 | 1/20 | 0.41 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.41 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.41 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.41 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.41 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.41 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.41 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.39 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20002011 | 0.79 | SLC22A2 (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL10791429 | 0.79 | SLC22A2 (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL21401948 | 0.79 | SLC22A2 (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL2239665 | 0.79 | SLC22A2 (0.36) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL31493460 | 0.76 | — | — | |
| SCHEMBL20042215 | 0.75 | SMN1; SMN2 (0.34) | SLC22A2SLC47A1MAPT | |
| SCHEMBL16590937 | 0.75 | SLC22A2 (0.33) | SLC22A2SLC47A1MAPT | |
| SCHEMBL20042213 | 0.75 | SMN1; SMN2 (0.34) | SLC22A2SLC47A1MAPT | |
| SCHEMBL20042216 | 0.75 | SMN1; SMN2 (0.34) | SLC22A2SLC47A1MAPT | |
| SCHEMBL3061818 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20020132181-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-09-19 | — | — | US | claimed |
| EP-1225480-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2002-07-24 | — | — | EP | claimed |
| US-20230408922-A1 | APPLICATION LIQUID FOR OPTICAL MEMBER, POLYMER, PHOTOSENSITIVE APPLICATION LIQUID, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING PATTERNED CURED FILM, AND METHOD FOR PRODUCING POLYMER | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-12-21 | — | — | US | disclosed |
| EP-4267548-A1 | COMPOSITIONS AND METHODS RELATED TO BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | The Broad Institute Inc. (US) | 2023-11-01 | — | — | EP | disclosed |
| US-20230333468-A1 | RESIN COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM, SUBSTRATE HAVING MULTILAYER FILM, METHOD FOR PRODUCING PATTERNED SUBSTRATE, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN CURED FILM, METHOD FOR PRODUCING POLYMER, AND METHOD FOR PRODUCING RESIN COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-10-19 | — | — | US | disclosed |
| US-20230322818-A1 | SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-10-12 | — | — | US | disclosed |
| CN-116601244-A | Coating liquid for optical member, polymer, cured film, photosensitive coating liquid, pattern cured film, optical member, solid-state imaging element, display device, silicone compound, stabilizer used in coating liquid, method for producing cured film, method for producing pattern cured film, and method for producing polymer | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116601210-A | Resin composition, cured film, method for producing cured film, substrate with multilayer film, method for producing substrate with pattern, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin composition | 中央硝子株式会社 | 2023-08-15 | — | — | CN | disclosed |
| US-20220242815-A1 | COMPOSITIONS AND METHODS RELATED TO DI-SUBSTITUTED BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | Instituto Carlos Slim de la Salud, A.C. (MX) | 2022-08-04 | — | — | US | disclosed |
| WO-2022140654-A1 | COMPOSITIONS AND METHODS RELATED TO BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | THE BROAD INSTITUTE, INC. (US) | 2022-06-30 | — | — | WO | disclosed |
| CN-114585630-A | Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method for producing cured film, patterned cured film, and method for producing patterned cured film | 中央硝子株式会社 | 2022-06-03 | — | — | CN | disclosed |
| US-20090061353-A1 | Positive-Type Resist Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2009-03-05 | — | — | US | disclosed |
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-12-18 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| JP-2003173026-A | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP | 2003-06-20 | — | — | JP | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
| EP-0251370-B1 | Cyclohexane-, cyclohexene- and cyclohexadiene, bicyclo[2.2.1]heptane and bicyclo [2.2.1]heptenecarboxylic acid esters, and also perfume compositions and perfumed products which contain one or more of said compounds as perfume component | NAARDEN INTERNATIONAL N.V. (NL) | 1989-10-25 | — | — | EP | disclosed |
| US-4843061-A | ORGANOLEPTIC | NAARDEN INTERNATIONAL N.V. (NL) | 1989-06-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080311507-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same | FRG1, FBXL19, FEM1B | GRIN2D 569/4885GRIN3B 883/4885GRIN1 367/4885 |
| US-20220242815-A1 | COMPOSITIONS AND METHODS RELATED TO DI-SUBSTITUTED BICYCLO[2.2.1] HEPTANAMINE-CONTAINING COMPOUNDS | PHOSPHO1, H4C1; H4C2; H4C3; H4C4; H4C5; H4C6; H4C8; H4C9; H4C11; H4C12; H4C13; H4C14; H4C15; H4C16, GRIN2C | GRIN2D 135/4885GRIN3B 229/4885GRIN1 273/4885 |
| US-20230322818-A1 | SILICON COMPOUND, REACTIVE MATERIAL, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, METHOD OF MANUFACTURING CURED FILM, PATTERNED CURED FILM, AND METHOD OF MANUFACTURING PATTERNED CURED FILM | RAD51, RER1, RPS4Y1 | GRIN2D 705/4885GRIN3B 1344/4885GRIN1 1284/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.