SCHEMBL28341809

SCHEMBL28341809

CN(C)CCCCCCCCCC[SiH](C)C

nearest known ligand 0.61

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.61
TSHR P16473 1/20 0.61
DNM1 Q05193 3/20 0.50
SIGMAR1 Q99720 2/20 0.37
HSD17B10 Q99714 1/20 0.37
HRH4 Q9H3N8 2/20 0.33
CYP1A2 P05177 1/20 0.33
HRH2 P25021 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
KDM4A O75164 6/20 0.32
KDM4C Q9H3R0 6/20 0.32
KDM5A P29375 1/20 0.32
KDM7A Q6ZMT4 1/20 0.32
PHF8 Q9UPP1 1/20 0.32
KDM2A Q9Y2K7 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20500117 1.00 ALDH1A1 (0.61) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL20500240 1.00 ALDH1A1 (0.61) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL28339434 1.00 ALDH1A1 (0.61) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL10635840 1.00 ALDH1A1 (0.61) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL16750965 0.88
SCHEMBL8083762 0.78 ALDH1A1 (1.00) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL1729138 0.78 ALDH1A1 (1.00) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL235238 0.78 ALDH1A1 (1.00) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL35856 0.78 ALDH1A1 (1.00) ALDH1A1TSHRDNM1SIGMAR1HSD17B10
SCHEMBL8087077 0.78 ALDH1A1 (1.00) ALDH1A1TSHRDNM1SIGMAR1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN claimed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN claimed
CN-110612364-B Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2022-04-05 CN disclosed
CN-110612364-A Selective deposition on silicon-containing surfaces 弗萨姆材料美国有限责任公司 2019-12-24 CN disclosed