⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14892826 | 1.00 | — | — | |
| SCHEMBL22105485 | 0.69 | — | — | |
| SCHEMBL19557136 | 0.69 | — | — | |
| SCHEMBL21374218 | 0.69 | — | — | |
| SCHEMBL5834989 | 0.69 | — | — | |
| SCHEMBL19557135 | 0.69 | — | — | |
| SCHEMBL28113174 | 0.67 | — | — | |
| SCHEMBL24847429 | 0.65 | — | — | |
| SCHEMBL21799434 | 0.65 | — | — | |
| SCHEMBL25057685 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233436-B | Method for increasing etching rate of silicon etching process by etching chamber pretreatment | 国际商业机器公司 | 2020-01-07 | — | — | CN | disclosed |