Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8203777 | 0.76 | — | — | |
| SCHEMBL8200971 | 0.76 | MEN1 (0.38) | MEN1KMT2ATSHRALDH1A1HPGD | |
| SCHEMBL8192716 | 0.73 | MEN1 (0.35) | MEN1KMT2A | |
| SCHEMBL8201539 | 0.73 | MEN1 (0.35) | MEN1KMT2A | |
| Bromide SCHEMBL1271543 | 0.71 | — | — | |
| SCHEMBL192598 | 0.71 | MEN1 (0.75) | MEN1KMT2ATSHRALDH1A1HPGD | |
| Perchlorate SCHEMBL9228246 | 0.69 | — | — | |
| SCHEMBL15516311 | 0.69 | — | — | |
| SCHEMBL7538221 | 0.69 | — | — | |
| SCHEMBL14860315 | 0.69 | ALDH1A1 (0.46) | MEN1KMT2ATSHRALDH1A1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2683792-B1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MAT USA INC (US) | 2019-09-25 | — | — | EP | disclosed |
| EP-2807289-B1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS (US) | 2016-09-21 | — | — | EP | disclosed |
| US-9200372-B2 | Passivation composition and process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2015-12-01 | — | — | US | disclosed |
| EP-2807289-A1 | ETCHING COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2014-12-03 | — | — | EP | disclosed |
| US-8889025-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-11-18 | — | — | US | disclosed |
| US-20140120734-A1 | Novel Etching Composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-05-01 | — | — | US | disclosed |
| US-8709277-B2 | Etching composition | FUJIFILM CORPORATION (JP) | 2014-04-29 | — | — | US | disclosed |
| WO-2014039186-A1 | ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-03-13 | — | — | WO | disclosed |
| US-20140073140-A1 | Etching Composition | FUJIFILM CORPORATION (JP) | 2014-03-13 | — | — | US | disclosed |
| US-8647523-B2 | Etching composition | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2014-02-11 | — | — | US | disclosed |
| EP-2683792-A1 | NOVEL ETCHING COMPOSITION | FujiFilm Electronic Materials USA, Inc. (US) | 2014-01-15 | — | — | EP | disclosed |
| US-20130122701-A1 | Novel Passivation Composition and Process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2013-05-16 | — | — | US | disclosed |
| WO-2013059806-A1 | Novel Passivation Composition and Process | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2013-04-25 | — | — | WO | disclosed |
| WO-2012125401-A1 | NOVEL ETCHING COMPOSITION | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2012-09-20 | — | — | WO | disclosed |
| US-20120231632-A1 | Novel Etching Composition | FUJIFILM CORPORATION (JP) | 2012-09-13 | — | — | US | disclosed |
| US-20100072418-A1 | Polishing slurry | FUJIFILM CORPORATION (JP) | 2010-03-25 | — | — | US | disclosed |