⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29133784 | 0.69 | — | — | |
| SCHEMBL28645287 | 0.67 | — | — | |
| SCHEMBL4486292 | 0.64 | — | — | |
| SCHEMBL8639901 | 0.64 | — | — | |
| SCHEMBL1866401 | 0.64 | — | — | |
| SCHEMBL3542283 | 0.64 | — | — | |
| SCHEMBL2175146 | 0.64 | — | — | |
| Hydrochloric Acid SCHEMBL28910180 | 0.62 | — | — | |
| SCHEMBL28895235 | 0.62 | — | — | |
| Bromide SCHEMBL29260637 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110660650-B | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2022-09-13 | — | — | CN | disclosed |
| CN-110660650-A | Semiconductor device and method for manufacturing the same | 台湾积体电路制造股份有限公司 | 2020-01-07 | — | — | CN | disclosed |
| CN-110609443-A | Photoresist compound | 台湾积体电路制造股份有限公司 | 2019-12-24 | — | — | CN | disclosed |