⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29997642 | 0.74 | — | — | |
| SCHEMBL6278856 | 0.69 | — | — | |
| SCHEMBL28612437 | 0.68 | — | — | |
| SCHEMBL28354522 | 0.67 | — | — | |
| SCHEMBL8522405 | 0.65 | — | — | |
| SCHEMBL28454156 | 0.63 | — | — | |
| SCHEMBL21378832 | 0.63 | — | — | |
| SCHEMBL23645892 | 0.58 | — | — | |
| SCHEMBL29175307 | 0.58 | — | — | |
| SCHEMBL6405311 | 0.58 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115840335-A | Negative photosensitive polyimide composition, method for producing pattern, cured product, and electronic component | 江苏艾森半导体材料股份有限公司 | 2023-03-24 | — | — | CN | disclosed |
| CN-107709408-B | Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device | 富士胶片株式会社 | 2020-02-14 | — | — | CN | disclosed |