SCHEMBL283608

SCHEMBL283608

CC1(NC2(C)CCCC2)CCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5703365 0.96 HDAC3 (0.31)
SCHEMBL284643 0.96 HDAC3 (0.31)
SCHEMBL40483 0.96 HDAC3 (0.31)
Hydrochloric Acid SCHEMBL6065616 0.93
SCHEMBL6177962 0.92
SCHEMBL6175710 0.84
Lindane SCHEMBL1354670 0.83
Formic Acid SCHEMBL11320536 0.81 HDAC3 (0.33)
Acetic Acid SCHEMBL3149742 0.81 ALDH1A1 (0.39)
SCHEMBL178436 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 92 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10113049-B2 Thermoplastic resin composition NIPPON NYUKAZAI CO., LTD. (JP) 2018-10-30 US claimed
US-20150329698-A1 THERMOPLASTIC RESIN COMPOSITION NIPPON NYUKAZAI CO., LTD. (JP) 2015-11-19 US claimed
EP-1114021-B1 NEW SALTS OF HMG-CoA REDUCTASE INHIBITORS LEK TOVARNA FARMACEVTSKIH (SI) 2004-07-14 EP claimed
CN-116134176-A Rust preventive oil composition 引能仕株式会社 2023-05-16 CN disclosed
CN-107068536-B Method of forming SiOCN material layer, material layer stack, semiconductor device and method of manufacturing the same, and deposition apparatus 三星电子株式会社 2021-12-28 CN disclosed
US-20210347962-A1 COMPOSITIONS COMPRISING ESTOLIDE COMPOUNDS AND METHODS OF MAKING AND USING THE SAME BIOSYNTHETIC TECHNOLOGIES, LLC (US) 2021-11-11 US disclosed
CN-107068680-B Integrated circuit device 三星电子株式会社 2020-10-23 CN disclosed
US-10460927-B2 Methods of fabricating a SiOCN layer using a first and second carbon precursor, the first carbon precursor being different from the second carbon precursor SAMSUNG ELECTRONICS CO., LTD. (KR) 2019-10-29 US disclosed
US-20190292350-A1 COMPOSITIONS COMPRISING ESTOLIDE COMPOUNDS AND METHODS OF MAKING AND USING THE SAME BIOSYNTHETIC TECHNOLOGIES LLC (US) 2019-09-26 US disclosed
US-20190287797-A1 METHODS OF FORMING A MATERIAL LAYER SAMSUNG ELECTRONICS CO LTD (KR) 2019-09-19 US disclosed
US-10240025-B2 Compositions comprising estolide compounds and methods of making and using the same BIOSYNTHETIC TECHNOLOGIES, LLC (US) 2019-03-26 US disclosed
WO-2001047635-A2 SUPPORTED CATALYST SYSTEM CONTAINING A METALLOCENE, A LEWIS BASE AND AN ELEMENTALLY ORGANIC COMPOUND OF MAIN GROUP III AND THE USE THEREOF BASELL POLYPROPYLEN GMBH (DE) 2001-07-05 WO disclosed
EP-1049376-A1 SELECTIVE HERBICIDES BASED ON N-ARYL- TRIAZOLINE(THI)ONS AND N-ARLYSULFONYLAMINO (THIO)CARBONYL- TRIAZOLINE(THI) ONS Bayer Aktiengesellschaft (DE) 2000-11-08 EP disclosed
WO-1999037153-A1 SELECTIVE HERBICIDES BASED ON N-ARYL- TRIAZOLINE(THI)ONS AND N-ARLYSULFONYLAMINO (THIO)CARBONYL- TRIAZOLINE(THI) ONS BAYER AKTIENGESELLSCHAFT (DE) 1999-07-29 WO disclosed
WO-1997008151-A1 SALTS OF N-(2-CYCLOPROPYLCARBONYL-PHENYLAMINOSULPHONYL)-N'-(4,6-DIMETHOXY-2-PYRIMIDINYL)-UREA BAYER AKTIENGESELLSCHAFT (DE) 1997-03-06 WO disclosed
EP-0382053-B1 PROCESS FOR THE PREPARATION OF ANTHRAQUINONE DERIVATIVES BASF Aktiengesellschaft (DE) 1993-09-22 EP disclosed
EP-0382053-A2 Process for the preparation of anthraquinone derivatives BASF Aktiengesellschaft (DE) 1990-08-16 EP disclosed
US-4558101-A FROM HYDROCARBON POLYMER CONTAINING OLEFINIC GROUPS WITH HYDROGEN CARBON MONOXIDE AND AMINE USING GROUP 8 METAL CATALYST W. R. GRACE & CO. (US) 1985-12-10 US disclosed
US-4526936-A Reacting polymeric hydrocarbon, primary or secondary amine, carbon monoxide, hydrogen, in the presence of group VIII metal catalyst W. R. GRACE & CO. (US) 1985-07-02 US disclosed
US-4312965-A Process for forming amine/amide containing polymers W. R. GRACE & CO. (US) 1982-01-26 US disclosed