Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | HTT | P42858 | 1/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 5/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.37 |
| ▸ | HPGD | P15428 | 1/20 | 0.37 |
| ▸ | CASP1 | P29466 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL27778946 | 0.83 | KDM4E (0.49) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| Sulfuric Acid SCHEMBL17273283 | 0.83 | KDM4E (0.49) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| SCHEMBL27774303 | 0.82 | KDM4E (0.47) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| SCHEMBL28487074 | 0.82 | TSHR (0.44) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| SCHEMBL2998201 | 0.81 | KDM4E (0.51) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| SCHEMBL28831790 | 0.80 | TSHR (0.42) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| SCHEMBL31037659 | 0.80 | TSHR (0.40) | TSHRKDM4EL3MBTL1ALDH1A1MAPT | |
| Toluene SCHEMBL28782370 | 0.79 | KDM4E (0.61) | KDM4EL3MBTL1MAPTCYP2D6MEN1 | |
| SCHEMBL23863190 | 0.78 | — | — | |
| SCHEMBL27774294 | 0.78 | KDM4E (0.44) | TSHRKDM4EL3MBTL1ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118957588-B | Metal film wiring etching solution and preparation method and application thereof | 达高工业技术研究院(广州)有限公司 | 2025-03-11 | — | — | CN | claimed |
| CN-119552136-A | Preparation method of 5-hydroxymethylfurfural aqueous solution | 中国科学院大连化学物理研究所 | 2025-03-04 | — | — | CN | claimed |
| CN-119219233-A | Nitrate removal method for salt-separating mother liquor of chemical high-salt wastewater | 北京恒其德生科技有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-118957588-A | Metal film wiring etching solution and preparation method and application thereof | 达高工业技术研究院(广州)有限公司 | 2024-11-15 | — | — | CN | claimed |
| CN-118817778-A | Humidity sensing material and preparation method and application thereof | 中移园区建设发展有限公司 | 2024-10-22 | — | — | CN | claimed |
| CN-118222086-B | Precipitation-resistant halogen-free flame-retardant polyamide composition and preparation method thereof | 诺为新材料(杭州)有限责任公司 | 2024-10-18 | — | — | CN | claimed |
| CN-118222086-A | Precipitation-resistant halogen-free flame-retardant polyamide composition and preparation method thereof | 诺为新材料(杭州)有限责任公司 | 2024-06-21 | — | — | CN | claimed |
| CN-118126000-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-06-04 | — | — | CN | claimed |
| CN-118026970-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-05-14 | — | — | CN | claimed |
| CN-118026971-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-05-14 | — | — | CN | claimed |
| CN-118005580-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-05-10 | — | — | CN | claimed |
| CN-117986211-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-05-07 | — | — | CN | claimed |
| CN-117986210-A | Preparation method of 5-hydroxymethylfurfural | 中国科学院大连化学物理研究所 | 2024-05-07 | — | — | CN | claimed |
| CN-117270341-A | Chip photoresist stripper composition, and preparation method and application thereof | 浙江奥首材料科技有限公司 | 2023-12-22 | — | — | CN | claimed |
| CN-111435705-B | Repairing agent and repairing method thereof and method for preparing photoelectric film | 杭州纤纳光电科技有限公司 | 2023-04-07 | — | — | CN | claimed |
| CN-114824206-A | Long-life high-first-efficiency hard carbon composite material and preparation method thereof | 晖阳(贵州)新能源材料有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-114570219-A | Pollution-resistant separation membrane with ionic liquid layer on surface and preparation method thereof | 浙江大学 | 2022-06-03 | — | — | CN | claimed |
| CN-112086564-A | Passivating agent and passivation method thereof and method for preparing semiconductor film | 杭州纤纳光电科技有限公司 | 2020-12-15 | — | — | CN | claimed |
| CN-108556186-B | Comprehensive treatment method of polyurethane waste material | 佛山市罟特化工贸易有限公司 | 2020-09-29 | — | — | CN | claimed |
| CN-111435705-A | Repairing agent and repairing method thereof and method for preparing photoelectric film | 杭州纤纳光电科技有限公司 | 2020-07-21 | — | — | CN | claimed |