⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL568723 | 0.78 | — | — | |
| SCHEMBL9634244 | 0.76 | — | — | |
| SCHEMBL309666 | 0.74 | ALDH1A1 (0.33) | — | |
| SCHEMBL1039821 | 0.74 | — | — | |
| Magnesium SCHEMBL30733161 | 0.72 | — | — | |
| SCHEMBL1263439 | 0.71 | MAPK1 (0.32) | — | |
| SCHEMBL15902501 | 0.71 | — | — | |
| SCHEMBL5029820 | 0.71 | — | — | |
| SCHEMBL5552811 | 0.70 | — | — | |
| SCHEMBL5032276 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106866719-B | Benzocyclobutene polycarbosilane polymerization monomer or resin and preparation method thereof | 西南科技大学 | 2020-05-15 | — | — | CN | claimed |
| CN-107298764-B | Polysilacyclobutane type siloxane photosensitive resin and preparation method thereof | 西南科技大学 | 2020-02-07 | — | — | CN | claimed |
| CN-106866719-B | Benzocyclobutene polycarbosilane polymerization monomer or resin and preparation method thereof | 西南科技大学 | 2020-05-15 | — | — | CN | disclosed |
| CN-106866719-B | Benzocyclobutene polycarbosilane polymerization monomer or resin and preparation method thereof | 西南科技大学 | 2020-05-15 | — | — | CN | disclosed |
| CN-107298764-B | Polysilacyclobutane type siloxane photosensitive resin and preparation method thereof | 西南科技大学 | 2020-02-07 | — | — | CN | disclosed |
| CN-107298764-B | Polysilacyclobutane type siloxane photosensitive resin and preparation method thereof | 西南科技大学 | 2020-02-07 | — | — | CN | disclosed |